Reflectance Biosensor Platform using Residual-Layer-Free Nanoimprint Lithography

Abstract

Nanoimprint lithography (NIL) is the simple method using stamp and UV or thermal curable resins for nanostructures/patterns with low cost, high-throughput, and high resolution. Residual-layer free NIL provides good performance of micro/nano-scale structures functional arrangements with 2/3D layouts. We demonstrated nanohole patterns of 200 nm pore size using residual-layer-free NIL without further process for removing residual layers for reflectance biosensor. The reflectance peaks of gold substrate are enhanced to 8 times using the hexagonal hole patterns of diameter 200 nm, and pitch 400 nm. So, this substrate can be applied for immune reflectance biosensor with magnetic nanoparticles for pre-treatment. © 2023 Society of Photo-Optical Instrumentation Engineers (SPIE)