Department of Physics and Chemistry
Future Semiconductor Nanophotonics Laboratory
1. Journal Articles
Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Bae, Jaeyeon | ko |
| dc.contributor.author | Jung, Jin-Woo | ko |
| dc.contributor.author | Park, Hyo Yul | ko |
| dc.contributor.author | Cho, Chang-Hee | ko |
| dc.contributor.author | Park, Jinhee | ko |
| dc.date.accessioned | 2018-01-11T12:46:06Z | - |
| dc.date.available | 2018-01-11T12:46:06Z | - |
| dc.date.created | 2018-01-01 | - |
| dc.date.issued | 2017-11 | - |
| dc.identifier.citation | Chemical Communications, v.53, no.89, pp.12100 - 12103 | - |
| dc.identifier.issn | 1359-7345 | - |
| dc.identifier.uri | http://hdl.handle.net/20.500.11750/4853 | - |
| dc.description.abstract | Despite their remarkable properties, metal-organic frameworks (MOFs) present vulnerable structures that are sensitive to moisture; therefore, their application to real field situations is challenging. Herein, an O2 plasma technique was introduced as a new method for the activation and protection of porosity in HKUST-1. In an unprecedented manner, O2 plasma-treated HKUST-1 retains its porosity after a long exposure to moisture as compared to pristine HKUST-1. Porosity retention was examined by N2 adsorption/desorption measurements of non-activated HKUST-1 after exposure to moisture. © 2017 The Royal Society of Chemistry. | - |
| dc.language | English | - |
| dc.publisher | Royal Society of Chemistry | - |
| dc.title | Oxygen plasma treatment of HKUST-1 for porosity retention upon exposure to moisture | - |
| dc.type | Article | - |
| dc.identifier.doi | 10.1039/c7cc05845d | - |
| dc.identifier.wosid | 000414587100009 | - |
| dc.identifier.scopusid | 2-s2.0-85033364946 | - |
| dc.type.local | Article(Overseas) | - |
| dc.type.rims | ART | - |
| dc.description.journalClass | 1 | - |
| dc.contributor.nonIdAuthor | Park, Hyo Yul | - |
| dc.identifier.citationVolume | 53 | - |
| dc.identifier.citationNumber | 89 | - |
| dc.identifier.citationStartPage | 12100 | - |
| dc.identifier.citationEndPage | 12103 | - |
| dc.identifier.citationTitle | Chemical Communications | - |
| dc.type.journalArticle | Article | - |
| dc.description.isOpenAccess | N | - |
| dc.subject.keywordPlus | METAL-ORGANIC FRAMEWORKS | - |
| dc.subject.keywordPlus | ROOM-TEMPERATURE | - |
| dc.subject.keywordPlus | CARBON-DIOXIDE | - |
| dc.subject.keywordPlus | ACTIVATION | - |
| dc.subject.keywordPlus | ADSORPTION | - |
| dc.subject.keywordPlus | STABILITY | - |
| dc.subject.keywordPlus | WATER | - |
| dc.subject.keywordPlus | RESISTANT | - |
| dc.subject.keywordPlus | CAPTURE | - |
| dc.subject.keywordPlus | STORAGE | - |
| dc.contributor.affiliatedAuthor | Cho, Chang-Hee | - |
| dc.contributor.affiliatedAuthor | Park, Jinhee | - |
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