DGIST Scholar: Conformal Coating of Conductive ZnO:Al Films as Transparent Electrodes on High Aspect Ratio Si Microrods

Title: Conformal Coating of Conductive ZnO:Al Films as Transparent Electrodes on High Aspect Ratio Si Microrods

Citation: Kong, Bo Hyun. (2010). Conformal Coating of Conductive ZnO:Al Films as Transparent Electrodes on High Aspect Ratio Si Microrods. Electrochemical and Solid State Letters, 13(2), K12–K14. doi: 10.1149/1.3267051

Keywords: ABSORPTION ; Al-Doped ZnO ; Aluminum ; Aspect Ratio ; Atomic Layer Deposition ; AZO Films ; Coatings ; Conductive Films ; Conformal Coatings ; DEPOSITION ; Electric Conductivity ; Electrical Conductivity ; Electrical Performance ; Electrodes ; High Aspect Ratio ; LIGHT-emITTING DEVICES ; Low Dimensional Structure ; Microrods ; Optical Films ; Optical Transmittance ; Optoelectronic Devices ; OXIDE ; Photoresists ; Polycrystalline Structure ; Pressure Drop ; SCATTERING ; Si Substrates ; Silicon ; Silicon Nanowires ; SOLAR-CELLS ; THIN-FILMS ; Transparent Conductive Oxides ; Transparent Electrode ; Zinc Oxide ; ZnO:Al Films

Abstract: Al-doped ZnO (AZO) thin films were grown by atomic layer deposition (ALD) for use as transparent conductive oxides on high aspect ratio Si microrod arrays. The ALD-deposited AZO films showed high optical transmittance and electrical conductivity despite their polycrystalline structures and resulted in a superior conformal coating on the surface and side regions of the Si microrods. The films also exhibited an electrical performance identical to that of the AZO film on a flat Si substrate. These results revealed that ALD-deposited AZO films are promising candidates for electrodes in the next-generation optoelectronic devices based on low dimensional structures, which require conformal coating. © 2009 The Electrochemical Society.

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