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Thickness-Dependent Phonon Renormalization and Enhanced Raman Scattering in Ultrathin Silicon Nanomembranes
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Title
Thickness-Dependent Phonon Renormalization and Enhanced Raman Scattering in Ultrathin Silicon Nanomembranes
DGIST Authors
Lee, Seon WooKim, Kang WonDhakal, Krishna P.Kim, Hyun MinYun, Won SeokLee, Jae DongCheong, Hyeon SikAhn, Jong Hyun
Issued Date
2017-12
Citation
Lee, Seon Woo. (2017-12). Thickness-Dependent Phonon Renormalization and Enhanced Raman Scattering in Ultrathin Silicon Nanomembranes. doi: 10.1021/acs.nanolett.7b03944
Type
Article
Article Type
Article
Author Keywords
Silicon nanomembranesRaman spectroscopyband-structure modulationultralow-frequency Raman spectra
Keywords
QUANTUM-WELLTHERMAL-CONDUCTIVITYMEMBRANESPHOTOLUMINESCENCESPECTROSCOPYCONFINEMENTSUBSTRATETRANSPORTOXIDATION
ISSN
1530-6984
Abstract
We report on the thickness-dependent Raman spectroscopy of ultrathin silicon (Si) nanomembranes (NMs), whose thicknesses range from 2 to 18 nm, using several excitation energies. We observe that the Raman intensity depends on the thickness and the excitation energy due to the combined effects of interference and resonance from the band-structure modulation. Furthermore, confined acoustic phonon modes in the ultrathin Si NMs were observed in ultralow-frequency Raman spectra, and strong thickness dependence was observed near the quantum limit, which was explained by calculations based on a photoelastic model. Our results provide a reliable method with which to accurately determine the thickness of Si NMs with thicknesses of less than a few nanometers. © 2017 American Chemical Society.
URI
http://hdl.handle.net/20.500.11750/5618
DOI
10.1021/acs.nanolett.7b03944
Publisher
American Chemical Society
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