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Title
Thickness-Dependent Phonon Renormalization and Enhanced Raman Scattering in Ultrathin Silicon Nanomembranes
DGIST Authors
Lee, Seon Woo ; Kim, Kang Won ; Dhakal, Krishna P. ; Kim, Hyun Min ; Yun, Won Seok ; Lee, Jae Dong ; Cheong, Hyeon Sik ; Ahn, Jong Hyun
Issued Date
2017-12
Citation
Lee, Seon Woo. (2017-12). Thickness-Dependent Phonon Renormalization and Enhanced Raman Scattering in Ultrathin Silicon Nanomembranes. doi: 10.1021/acs.nanolett.7b03944
Type
Article
Article Type
Article
Author Keywords
Silicon nanomembranes ; Raman spectroscopy ; band-structure modulation ; ultralow-frequency Raman spectra
Keywords
QUANTUM-WELL ; THERMAL-CONDUCTIVITY ; MEMBRANES ; PHOTOLUMINESCENCE ; SPECTROSCOPY ; CONFINEMENT ; SUBSTRATE ; TRANSPORT ; OXIDATION
ISSN
1530-6984
Abstract

We report on the thickness-dependent Raman spectroscopy of ultrathin silicon (Si) nanomembranes (NMs), whose thicknesses range from 2 to 18 nm, using several excitation energies. We observe that the Raman intensity depends on the thickness and the excitation energy due to the combined effects of interference and resonance from the band-structure modulation. Furthermore, confined acoustic phonon modes in the ultrathin Si NMs were observed in ultralow-frequency Raman spectra, and strong thickness dependence was observed near the quantum limit, which was explained by calculations based on a photoelastic model. Our results provide a reliable method with which to accurately determine the thickness of Si NMs with thicknesses of less than a few nanometers. © 2017 American Chemical Society.

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URI
http://hdl.handle.net/20.500.11750/5618
DOI
10.1021/acs.nanolett.7b03944
Publisher
American Chemical Society
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