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Department of Electrical Engineering and Computer Science
Dynamic Systems and Control Laboratory
2. Conference Papers
The Value of In-Line Metrology for Advanced Process Control: AM: Advanced Metrology
Lee, Jaeho
;
Kim, Mike Young-Han
;
Eun, Yongsoon
Department of Electrical Engineering and Computer Science
Dynamic Systems and Control Laboratory
2. Conference Papers
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Title
The Value of In-Line Metrology for Advanced Process Control: AM: Advanced Metrology
Issued Date
2024-05-14
Citation
Lee, Jaeho. (2024-05-14). The Value of In-Line Metrology for Advanced Process Control: AM: Advanced Metrology. 35th Annual SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2024, 1–4. doi: 10.1109/ASMC61125.2024.10545372
Type
Conference Paper
ISBN
9798350384550
ISSN
1078-8743
Abstract
In-line metrology provides critical information for feedback and feedforward process control. In high-volume manufacturing, the fundamental question is: how fast, how frequent, and how accurate measurements should be made to satisfy control requirements. This paper develops a framework to study the tradeoff among the sampling rate, the delay, and the quality of measurements and the effect of these canonical factors on the variability of processes. As a consequence of this fundamental tradeoff, the relative value of virtual metrology with respect to real metrology can be quantified in the context of advanced process control. © 2024 IEEE.
URI
http://hdl.handle.net/20.500.11750/56870
DOI
10.1109/ASMC61125.2024.10545372
Publisher
Institute of Electrical and Electronics Engineers Inc.
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Eun, Yongsoon
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Department of Electrical Engineering and Computer Science
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