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Semiconductor memory and method of manufacturing the same
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dc.contributor.author 김대희 -
dc.contributor.author 김홍수 -
dc.contributor.author 황윤주 -
dc.contributor.author 박영호 -
dc.contributor.author 인수일 -
dc.date.accessioned 2025-07-24T17:10:13Z -
dc.date.available 2025-07-24T17:10:13Z -
dc.identifier.uri https://scholar.dgist.ac.kr/handle/20.500.11750/58703 -
dc.description.abstract In a semiconductor memory of the invention, the source or drain of a transfer gate MOS transistor is electrically connected to a charge storage first conductive layer through a third conductive layer. -
dc.title Semiconductor memory and method of manufacturing the same -
dc.title.alternative Carbon electrode for dye-sensitized betavoltaic battery, Betavoltaic battery using the same and manufacturing method thereof -
dc.type Patent -
dc.identifier.bibliographicCitation 김대희. Semiconductor memory and method of manufacturing the same. -
dc.publisher.country UN -
dc.identifier.patentApplicationNumber 07646496 -
dc.date.application 1991-01-28 -
dc.identifier.patentRegistrationNumber 05187566 -
dc.date.registration 1993-02-16 -
dc.contributor.assignee Kabushiki Kaisha Toshiba -
dc.type.iprs 특허 -
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인수일
In, Su-Il인수일

Department of Energy Science and Engineering

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