SUBSTRATE-PROCESSING DEVICE

Abstract

An embodiment of the present invention provides a substrate-processing device comprising: an outer housing that forms the exterior; an inner housing that is inserted into the interior of the outer housing to be rotated relative to the outer housing and includes a mounting unit on which an object to be processed is mounted; a sputter unit disposed in the outer housing to form a thin film on the surface of the object to be processed; and a drive unit for providing a driving force that enables the inner housing to rotate, wherein the mounting unit has recesses arranged on the outer circumferential surface of the inner housing toward the center thereof.