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The Effect of In situ Magnetic Field on Magnetic Properties and Residual Stress of Fe-Based Amorphous Film

Title
The Effect of In situ Magnetic Field on Magnetic Properties and Residual Stress of Fe-Based Amorphous Film
Authors
Wang, SiboKim, Hoe JoonChen, JunLaughlin, Devid E.Piazza, GianlucaZhu, Jingxi
DGIST Authors
Kim, Hoe Joon
Issue Date
2018-06
Citation
IEEE Transactions on Magnetics, 54(6), 1-8
Type
Article
Article Type
Article
Author Keywords
Anisotropycoercivityin situ fieldmagnetostrictionresidual stress
Keywords
THIN-FILMS
ISSN
0018-9464
Abstract
Fe-based amorphous thin films of two compositions (Fe₈₀ and Fe65.6Co9.4B25) were deposited by RF magnetron sputtering with and without applying an in situ magnetic field along the films' in-plane direction. In addition, films with varying thickness were deposited for each composition. Hysteresis loops and residual stress were measured and compared to study the effect of in situ fields on the magnetic and magnetostrictive behavior of the films. Results showed that in situ magnetic fields can lower the in-plane coercivity for the Fe₈₀ films. Also, when the residual stress was below a certain level, its distribution in different directions shows a uniaxial feature due to the applied in situ field. This uniaxial distribution of stress adds an extra magnetoelastic anisotropy to the films. This paper provides insight for optimizing magnetic thin films' properties for applications where the magnetostriction is relevant, in terms of the in situ magnetic field, coercivity, and residual stress. IEEE
URI
http://hdl.handle.net/20.500.11750/6386
DOI
10.1109/TMAG.2018.2808355
Publisher
Institute of Electrical and Electronics Engineers Inc.
Related Researcher
  • Author Kim, Hoe Joon Nano Materials and Devices Lab
  • Research Interests MEMS/NEMS; Micro/Nano Sensors; Piezoelectric Devices; Nanomaterials; Heat Transfer; Atomic Force Microscope
Files:
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Collection:
Department of Robotics EngineeringNano Materials and Devices Lab1. Journal Articles


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