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Low temperature atomic layer deposited molybdenum nitride-Ni-foam composite: An electrode for efficient charge storage

Title
Low temperature atomic layer deposited molybdenum nitride-Ni-foam composite: An electrode for efficient charge storage
Authors
Nandi, Dip K.Sahoo, SumantaKim, Tae HyunCheon, Tae HoonSinha, SoumyadeepRahul, RameshJang, Yu JjinBae, Jong SeongHeo, Jae YeongShim, Jae JinKim, Soo Hyun
Issue Date
2018-08
Citation
Electrochemistry Communications, 93, 114-118
Type
Article
Article Type
Article
Keywords
AtomsElectrodesFoamsHigh resolution transmission electron microscopyMolybdenum compoundsNickel compoundsNitridesRedox reactionsScanning electron microscopyTemperatureTransmission electron microscopyAreal capacityAtomic layer depositedCharacterization techniquesConformal coatingsCycle stabilityCyclic stabilityMolybdenum nitrideScanning and transmission electron microscopyAtomic layer deposition
ISSN
1388-2481
Abstract
Molybdenum nitride (MoNx) was directly grown on 3-dimensional Ni-foam (NF) at relatively low temperature of 250 °C by atomic layer deposition (ALD) and then tested as an electrode for charge storage. The successful formation of MoNx@NF composite was confirmed by several characterization techniques. The scanning and transmission electron microscopy analyses showed the extremely uniform and conformal coating of the MoNx on NF. The presence of NF influenced the redox-reactions in the composite and established the composite as a potential electrode for efficient charge-storage. High areal capacity (geometrical) of 130 mC/cm2 was achieved at a current density of 2 mA/cm2. The excellent cyclic stability reflected the conducting nature of the composite. © 2018 Elsevier B.V.
URI
http://hdl.handle.net/20.500.11750/9022
DOI
10.1016/j.elecom.2018.07.003
Publisher
Elsevier Inc.
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