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Showing results 21 to 23 of 23

Issue Date	Title Author(s) Journal	View
2014-07-01	The effects of nitrogen incorporation on the properties of atomic layer deposited Ru thin films as a direct-plateable diffusion barrier for Cu interconnect Mun, Ki-Yeung ; Hong, Tae Eun ; Cheon, Taehoon ; Jang, Yujin ; Lim, Byoung-Yong ; Kim, Sunjung ; Kim, Soo-Hyun Thin Solid Films, v.562, pp.118 - 125, 2014-07-01	498
2019-11	Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery Nandi, Dip K. ; Yeo, Seungmin ; Ansari, Mohd Zahid ; Sinha, Soumyadeep ; Cheon, Taehoon ; Kwon, Jiseok ; Kim, Hyungjun ; Heo, Jaeyeong ; Song, Taeseup ; Kim, Soo-Hyun Elsevier Ltd, 2019-11	556
2021-02	Ultralow Loading (Single-Atom and Clusters) of the Pt Catalyst by Atomic Layer Deposition Using Dimethyl ((3,4-eta) N,N-dimethyl-3-butene-1-amine-N) Platinum (DDAP) on the High-Surface-Area Substrate for Hydrogen Evolution Reaction Ramesh, Rahul ; Han, Seungmin ; Nandi, Dip K. ; Sawant, Sandesh Y. ; Kim, Deok Hyun ; Cheon, Taehoon ; Cho, Moo Hwan ; Harada, Ryosuke ; Shigetomi, Toshiyuki ; Suzuki, Kazuharu ; et al Advanced Materials Interfaces, v.8, no.3, pp.2001508, 2021-02	359

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