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- Ansari, Mohd Zahid ;
- Parveen, Nazish ;
- Nandi, Dip K. ;
- Ramesh, Rahul ;
- Ansari, Sajid Ali ;
- Cheon, Taehoon ;
- Kim, Soo-Hyun
- 2019-07
- Ansari, Mohd Zahid. (2019-07). Enhanced activity of highly conformal and layered tin sulfide (SnSx) prepared by atomic layer deposition (ALD) on 3D metal scaffold towards high performance supercapacitor electrode. doi: 10.1038/s41598-019-46679-7
- Nature Publishing Group
- View : 1054
- Download : 281
- Mohapatra, Debananda ;
- Byun, Jeong Eun ;
- Ansari, Mohd Zahid ;
- Kim, Haekyoung ;
- ;
- Jang, Jongmoon ;
- Cho, Young-Rae ;
- Lee, Jung Woo ;
- Kim, Soo-Hyun
- 2023-12
- Mohapatra, Debananda. (2023-12). Layer Engineered MXene Empowered Wearable Pressure Sensors for Non-Invasive Vital Human–Machine Interfacing Healthcare Monitoring. Advanced Materials Technologies, 8(24). doi: 10.1002/admt.202301175
- Wiley
- View : 96
- Download : 0
- Ansari, Mohd Zahid ;
- Nandi, Dip K. ;
- Janicek, Petr ;
- Ansari, Sajid Ali ;
- Ramesh, Rahul ;
- ;
- Shong, Bonggeun ;
- Kim, Soo-Hyun
- 2019-11
- Ansari, Mohd Zahid. (2019-11). Low-Temperature Atomic Layer Deposition of Highly Conformal Tin Nitride Thin Films for Energy Storage Devices. ACS Applied Materials & Interfaces, 11(46), 43608–43621. doi: 10.1021/acsami.9b15790
- American Chemical Society
- View : 866
- Download : 0
- Ansari, Mohd Zahid ;
- Janicek, Petr ;
- Namgung, Sook ;
- Kim, Hyangil ;
- Nandi, Dip K. ;
- ;
- Siddiqui, Masoom Raza ;
- Imran, Muhammad ;
- Jang, Yujin ;
- Bae, Jong-Seong ; et al
- 2024-03
- Ansari, Mohd Zahid. (2024-03). New class of Zr precursor containing boratabenzene ligand enabling highly conformal wafer-scale zirconium dioxide thin films through atomic layer deposition. Surfaces and Interfaces, 46. doi: 10.1016/j.surfin.2024.104014
- Elsevier
- View : 309
- Download : 0
- Ansari, Mohd Zahid ;
- Janicek, Petr ;
- Park, Ye Jin ;
- NamGung, Sook ;
- Cho, Bo Yeon ;
- Nandi, Dip K. ;
- Jang, Yujin ;
- Bae, Jong-Seong ;
- Hong, Tae Eun ;
- ; et al
- 2023-05
- Ansari, Mohd Zahid. (2023-05). Preparation of wafer-scale highly conformalamorphous hafnium dioxide thin films by atomic layer deposition using a thermally stable boratabenzene ligand-containing hafnium precursor. Applied Surface Science, 620. doi: 10.1016/j.apsusc.2023.156834
- Elsevier BV
- View : 212
- Download : 0
- Mohapatra, Debananda ;
- Shin, Yujin ;
- Ansari, Mohd Zahid ;
- Kim, Youn-Hye ;
- Park, Ye Jin ;
- ;
- Kim, Haekyoung ;
- Lee, Jung Woo ;
- Kim, Soo-Hyun
- 2023-04
- Mohapatra, Debananda. (2023-04). Process Controlled Ruthenium on 2D Engineered V-MXene via Atomic Layer Deposition for Human Healthcare Monitoring. Advanced Science, 10(12). doi: 10.1002/advs.202206355
- John Wiley and Sons Inc
- View : 153
- Download : 44
- Nandi, Dip K. ;
- Yeo, Seungmin ;
- Ansari, Mohd Zahid ;
- Sinha, Soumyadeep ;
- Cheon, Taehoon ;
- Kwon, Jiseok ;
- Kim, Hyungjun ;
- Heo, Jaeyeong ;
- Song, Taeseup ;
- Kim, Soo-Hyun
- 2019-11
- Nandi, Dip K. (2019-11). Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery. doi: 10.1016/j.electacta.2019.134766
- Elsevier Ltd
- View : 829
- Download : 0
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