Browsing by Titles

All A B C D E F G H I J K L M N O P Q R S T U V W X Y Z
전체 가 나 다 라 마 바 사 아 자 차 카 타 파 하

Showing results 1 to 3 of 3

Detailed Visualization of Phase Evolution during Rapid Formation of Cu(InGa)Se-2 Photovoltaic Absorber from Mo/CuGa/In/Se Precursors

Article
Detailed Visualization of Phase Evolution during Rapid Formation of Cu(InGa)Se-2 Photovoltaic Absorber from Mo/CuGa/In/Se Precursors
  • Koo, Jaseok ; 
  • Kim, Sam Mi ; 
  • Cheon, Tae Hoon ; 
  • Kim, Soo-Hyun ; 
  • Kim, Woo Kyoung
  • 2018-03
  • Koo, Jaseok. (2018-03). Detailed Visualization of Phase Evolution during Rapid Formation of Cu(InGa)Se-2 Photovoltaic Absorber from Mo/CuGa/In/Se Precursors. Scientific Reports, 8. doi: 10.1038/s41598-018-22214-y
  • NATURE PUBLISHING GROUP
  • View : 613
  • Download : 136
Article
Low temperature atomic layer deposited molybdenum nitride-Ni-foam composite: An electrode for efficient charge storage
  • Nandi, Dip K. ; 
  • Sahoo, Sumanta ; 
  • Kim, Tae Hyun ; 
  • Cheon, Tae Hoon ; 
  • Sinha, Soumyadeep ; 
  • Rahul, Ramesh ; 
  • Jang, Yu Jjin ; 
  • Bae, Jong Seong ; 
  • Heo, Jae Yeong ; 
  • Shim, Jae Jin ; 
    • et al
  • 2018-08
  • Nandi, Dip K. (2018-08). Low temperature atomic layer deposited molybdenum nitride-Ni-foam composite: An electrode for efficient charge storage. Electrochemistry Communications, 93, 114–118. doi: 10.1016/j.elecom.2018.07.003
  • Elsevier Inc.
  • View : 785
  • Download : 0
Article
Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
  • Choi, Sang Kyung ; 
  • Kim, Han Gil ; 
  • Kim, Jun Beam ; 
  • Cheon, Tae Hoon ; 
  • Seo, Jong Hyun ; 
  • Kim, Soo Hyun
  • 2015
  • Choi, Sang Kyung. (2015). Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization. doi: 10.1016/j.tsf.2015.05.033
  • Elsevier
  • View : 777
  • Download : 0
1