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Issue Date Title Author(s) Journal View
2012-10
A bilayer diffusion barrier of Ru/WSixNy for advanced Cu interconnects

Eom, Tae-Kwang ;  Sari, Windu ;  Cheon, Taehoon ;  Kim, Soo-Hyun ;  Kim, Woo Kyoung

Elsevier BV, 2012-10

 651
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