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Conformal and Ultra Shallow Junction Formation Achieved Using a Pulsed-Laser Annealing Process Integrated With a Modified Plasma Assisted Doping Method

  • 2020-09
  • Baik, Seunghun. (2020-09). Conformal and Ultra Shallow Junction Formation Achieved Using a Pulsed-Laser Annealing Process Integrated With a Modified Plasma Assisted Doping Method. IEEE Access, 8, 172166–172174. doi: 10.1109/ACCESS.2020.3024636
  • Institute of Electrical and Electronics Engineers Inc.
  • View : 705
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  • 2022-08
  • Jeong, Heejae. (2022-08). High and Uniform Phosphorus Doping in Germanium through a Modified Plasma Assisted Delta Doping Process with H2 Plasma Treatment. IEEE Electron Device Letters, 43(8), 1315–1318. doi: 10.1109/LED.2022.3182730
  • Institute of Electrical and Electronics Engineers
  • View : 597
  • Download : 0
  • 2011-01
  • Kim, Dong Hwan. (2011-01). Influence of powder morphology on thermoelectric anisotropy of spark-plasma-sintered Bi-Te-based thermoelectric materials. Acta Materialia, 59(1), 405–411. doi: 10.1016/j.actamat.2010.09.054
  • Elsevier Ltd
  • View : 698
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  • 2011-01
  • Kim, Dong Hwan. (2011-01). Influence of powder morphology on thermoelectric anisotropy of spark-plasma-sintered Bi-Te-based thermoelectric materials. Acta Materialia, 59(1), 405–411. doi: 10.1016/j.actamat.2010.09.054
  • Elsevier Ltd
  • View : 276
  • Download : 0
  • 2009-02
  • Kim, Kang-Pil. (2009-02). Work Function Modification of Indium-Tin Oxide by Surface Plasma Treatments Using Different Gases. Japanese Journal of Applied Physics, 48(2). doi: 10.1143/JJAP.48.021601
  • Japan Society of Applied Physics
  • View : 203
  • Download : 0
  • 2009-02
  • Kim, Kang-Pil. (2009-02). Work Function Modification of Indium-Tin Oxide by Surface Plasma Treatments Using Different Gases. Japanese Journal of Applied Physics, 48(2). doi: 10.1143/JJAP.48.021601
  • IOP Publishing
  • View : 901
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