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Article
Atomic layer deposition of Ru thin film using N-2/H-2 plasma as a reactant
  • Hong, TE[Hong, Tae Eun] ; 
  • Mun, KY[Mun, Ki-Yeung] ; 
  • Choi, SK[Choi, Sang-Kyung] ; 
  • Park, JY[Park, Ji-Yoon] ; 
  • Kim, SH[Kim, Soo-Hyun] ; 
  • Cheon, T[Cheon, Taehoon] ; 
  • Kim, WK[Kim, Woo Kyoung] ; 
  • Lim, BY[Lim, Byoung-Yong] ; 
  • Kim, S[Kim, Sunjung]
  • 2012-07-31
  • Hong, TE[Hong, Tae Eun]. (2012-07-31). Atomic layer deposition of Ru thin film using N-2/H-2 plasma as a reactant. doi: 10.1016/j.tsf.2012.05.069
  • ELSEVIER SCIENCE SA
  • View : 801
  • Download : 0
Article
Low Temperature Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and O-2
  • Eom, Tae-Kwang ; 
  • Sari, Windu ; 
  • Choi, Kyu-Jeong ; 
  • Shin, Woong-Chul ; 
  • Kim, Jae Hyun ; 
  • Lee, Do-Joong ; 
  • Kim, Ki-Bum ; 
  • Sohn, Hyunchul ; 
  • Kim, Soo-Hyun
  • 2009
  • Eom, Tae-Kwang. (2009). Low Temperature Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and O-2. Electrochemical and Solid State Letters, 12(11), D85–D88. doi: 10.1149/1.3207867
  • Electrochemical Society
  • View : 336
  • Download : 0
Article
Low Temperature Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and O-2
  • Eom, Tae-Kwang ; 
  • Sari, Windu ; 
  • Choi, Kyu-Jeong ; 
  • Shin, Woong-Chul ; 
  • Kim, Jae Hyun ; 
  • Lee, Do-Joong ; 
  • Kim, Ki-Bum ; 
  • Sohn, Hyunchul ; 
  • Kim, Soo-Hyun
  • 2009
  • Eom, Tae-Kwang. (2009). Low Temperature Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and O-2. Electrochemical and Solid State Letters, 12(11), D85–D88. doi: 10.1149/1.3207867
  • Electrochemical Society
  • View : 905
  • Download : 0
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