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Showing results 1 to 9 of 9

  • Son, Yeseul ; 
  • Kim, Sang Bok ; 
  • Mohapatra, Debananda ; 
  • Cheon, Taehoon ; 
  • Kim, Soo-Hyun
  • 2025-08
  • Advanced Science, v.12, no.29
  • Wiley
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Atomic Layer Deposition법에 의한 Al-doped ZnO Films의 전기적 및 광학적 특성

  • An, Ha Rim ; 
  • Baek, Seong Ho ; 
  • Park, Il Kyu ; 
  • Ahn, Hyo Jin
  • 2013-08
  • An, Ha Rim. (2013-08). Atomic Layer Deposition법에 의한 Al-doped ZnO Films의 전기적 및 광학적 특성. Korean Journal of Materials Research, 23(8), 469–475. doi: 10.3740/MRSK.2013.23.8.469
  • 한국재료학회
  • View : 903
  • Download : 141
  • Ramesh, Rahul ; 
  • Nandi, Dip K. ; 
  • Kim, Tae Hyun ; 
  • Cheon, Taehoon ; 
  • Oh, Jihun ; 
  • Kim, Soo-Hyun
  • 2019-05
  • Ramesh, Rahul. (2019-05). Atomic-Layer-Deposited MoN x Thin Films on Three-Dimensional Ni Foam as Efficient Catalysts for the Electrochemical Hydrogen Evolution Reaction. doi: 10.1021/acsami.8b20437
  • American Chemical Society
  • View : 971
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  • Yun, Hwang-Sik ; 
  • Noh, Kyeongchan ; 
  • Kim, Jigeon ; 
  • Noh, Sung Hoon ; 
  • Kim, Gi-Hwan ; 
  • Lee, Woongkyu ; 
  • Na, Hyon Bin ; 
  • Yoon, Tae-Sik ; 
  • Jang, Jaeyoung ; 
  • Kim, Younghoon ; 
  • et al
  • 2020-01
  • Yun, Hwang-Sik. (2020-01). CsPbBr3 Perovskite Quantum Dot Light-Emitting Diodes Using Atomic Layer Deposited Al2O3 and ZnO Interlayers. doi: 10.1002/pssr.201900573
  • Wiley - VCH Verlag GmbH & CO. KGaA
  • View : 1098
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  • Eom, Tae-Kwang ; 
  • Sari, Windu ; 
  • Choi, Kyu-Jeong ; 
  • Shin, Woong-Chul ; 
  • Kim, Jae Hyun ; 
  • Lee, Do-Joong ; 
  • Kim, Ki-Bum ; 
  • Sohn, Hyunchul ; 
  • Kim, Soo-Hyun
  • 2009
  • Eom, Tae-Kwang. (2009). Low Temperature Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and O-2. Electrochemical and Solid State Letters, 12(11), D85–D88. doi: 10.1149/1.3207867
  • Electrochemical Society
  • View : 410
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  • Eom, Tae-Kwang ; 
  • Sari, Windu ; 
  • Choi, Kyu-Jeong ; 
  • Shin, Woong-Chul ; 
  • Kim, Jae Hyun ; 
  • Lee, Do-Joong ; 
  • Kim, Ki-Bum ; 
  • Sohn, Hyunchul ; 
  • Kim, Soo-Hyun
  • 2009
  • Eom, Tae-Kwang. (2009). Low Temperature Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and O-2. Electrochemical and Solid State Letters, 12(11), D85–D88. doi: 10.1149/1.3207867
  • Electrochemical Society
  • View : 996
  • Download : 0
  • Ansari, Mohd Zahid ; 
  • Nandi, Dip K. ; 
  • Janicek, Petr ; 
  • Ansari, Sajid Ali ; 
  • Ramesh, Rahul ; 
  • Cheon, Taehoon ; 
  • Shong, Bonggeun ; 
  • Kim, Soo-Hyun
  • 2019-11
  • Ansari, Mohd Zahid. (2019-11). Low-Temperature Atomic Layer Deposition of Highly Conformal Tin Nitride Thin Films for Energy Storage Devices. ACS Applied Materials & Interfaces, 11(46), 43608–43621. doi: 10.1021/acsami.9b15790
  • American Chemical Society
  • View : 972
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Process Controlled Ruthenium on 2D Engineered V-MXene via Atomic Layer Deposition for Human Healthcare Monitoring

  • Mohapatra, Debananda ; 
  • Shin, Yujin ; 
  • Ansari, Mohd Zahid ; 
  • Kim, Youn-Hye ; 
  • Park, Ye Jin ; 
  • Cheon, Taehoon ; 
  • Kim, Haekyoung ; 
  • Lee, Jung Woo ; 
  • Kim, Soo-Hyun
  • 2023-04
  • Mohapatra, Debananda. (2023-04). Process Controlled Ruthenium on 2D Engineered V-MXene via Atomic Layer Deposition for Human Healthcare Monitoring. Advanced Science, 10(12). doi: 10.1002/advs.202206355
  • John Wiley and Sons Inc
  • View : 238
  • Download : 109
  • Ramesh, Rahul ; 
  • Han, Seungmin ; 
  • Nandi, Dip K. ; 
  • Sawant, Sandesh Y. ; 
  • Kim, Deok Hyun ; 
  • Cheon, Taehoon ; 
  • Cho, Moo Hwan ; 
  • Harada, Ryosuke ; 
  • Shigetomi, Toshiyuki ; 
  • Suzuki, Kazuharu ; 
  • et al
  • 2021-02
  • Ramesh, Rahul. (2021-02). Ultralow Loading (Single-Atom and Clusters) of the Pt Catalyst by Atomic Layer Deposition Using Dimethyl ((3,4-eta) N,N-dimethyl-3-butene-1-amine-N) Platinum (DDAP) on the High-Surface-Area Substrate for Hydrogen Evolution Reaction. Advanced Materials Interfaces, 8(3), 2001508. doi: 10.1002/admi.202001508
  • Wiley-VCH Verlag
  • View : 608
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