Showing results 1 to 9 of 9
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Son, Yeseul
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Kim, Sang Bok
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Mohapatra, Debananda
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Cheon, Taehoon
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Kim, Soo-Hyun
- 2025-08
- Advanced Science, v.12, no.29
- Wiley
- View : 100
- Download : 0
- 2013-08
- An, Ha Rim. (2013-08). Atomic Layer Deposition법에 의한 Al-doped ZnO Films의 전기적 및 광학적 특성. Korean Journal of Materials Research, 23(8), 469–475. doi: 10.3740/MRSK.2013.23.8.469
- 한국재료학회
- View : 782
- Download : 68
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Ramesh, Rahul
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Nandi, Dip K.
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Kim, Tae Hyun
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Cheon, Taehoon
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Oh, Jihun
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Kim, Soo-Hyun
- 2019-05
- Ramesh, Rahul. (2019-05). Atomic-Layer-Deposited MoN x Thin Films on Three-Dimensional Ni Foam as Efficient Catalysts for the Electrochemical Hydrogen Evolution Reaction. doi: 10.1021/acsami.8b20437
- American Chemical Society
- View : 862
- Download : 0
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Yun, Hwang-Sik
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Noh, Kyeongchan
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Kim, Jigeon
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Noh, Sung Hoon
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Kim, Gi-Hwan
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Lee, Woongkyu
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Na, Hyon Bin
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Yoon, Tae-Sik
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Jang, Jaeyoung
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Kim, Younghoon
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et al
- 2020-01
- Yun, Hwang-Sik. (2020-01). CsPbBr3 Perovskite Quantum Dot Light-Emitting Diodes Using Atomic Layer Deposited Al2O3 and ZnO Interlayers. doi: 10.1002/pssr.201900573
- Wiley - VCH Verlag GmbH & CO. KGaA
- View : 958
- Download : 0
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Eom, Tae-Kwang
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Sari, Windu
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Choi, Kyu-Jeong
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Shin, Woong-Chul
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Kim, Jae Hyun
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Lee, Do-Joong
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Kim, Ki-Bum
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Sohn, Hyunchul
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Kim, Soo-Hyun
- 2009
- Eom, Tae-Kwang. (2009). Low Temperature Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and O-2. Electrochemical and Solid State Letters, 12(11), D85–D88. doi: 10.1149/1.3207867
- Electrochemical Society
- View : 314
- Download : 0
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Eom, Tae-Kwang
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Sari, Windu
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Choi, Kyu-Jeong
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Shin, Woong-Chul
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Kim, Jae Hyun
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Lee, Do-Joong
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Kim, Ki-Bum
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Sohn, Hyunchul
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Kim, Soo-Hyun
- 2009
- Eom, Tae-Kwang. (2009). Low Temperature Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and O-2. Electrochemical and Solid State Letters, 12(11), D85–D88. doi: 10.1149/1.3207867
- Electrochemical Society
- View : 874
- Download : 0
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Ansari, Mohd Zahid
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Nandi, Dip K.
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Janicek, Petr
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Ansari, Sajid Ali
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Ramesh, Rahul
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Cheon, Taehoon
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Shong, Bonggeun
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Kim, Soo-Hyun
- 2019-11
- Ansari, Mohd Zahid. (2019-11). Low-Temperature Atomic Layer Deposition of Highly Conformal Tin Nitride Thin Films for Energy Storage Devices. ACS Applied Materials & Interfaces, 11(46), 43608–43621. doi: 10.1021/acsami.9b15790
- American Chemical Society
- View : 842
- Download : 0
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Mohapatra, Debananda
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Shin, Yujin
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Ansari, Mohd Zahid
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Kim, Youn-Hye
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Park, Ye Jin
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Cheon, Taehoon
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Kim, Haekyoung
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Lee, Jung Woo
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Kim, Soo-Hyun
- 2023-04
- Mohapatra, Debananda. (2023-04). Process Controlled Ruthenium on 2D Engineered V-MXene via Atomic Layer Deposition for Human Healthcare Monitoring. Advanced Science, 10(12). doi: 10.1002/advs.202206355
- John Wiley and Sons Inc
- View : 130
- Download : 31
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Ramesh, Rahul
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Han, Seungmin
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Nandi, Dip K.
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Sawant, Sandesh Y.
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Kim, Deok Hyun
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Cheon, Taehoon
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Cho, Moo Hwan
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Harada, Ryosuke
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Shigetomi, Toshiyuki
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Suzuki, Kazuharu
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et al
- 2021-02
- Ramesh, Rahul. (2021-02). Ultralow Loading (Single-Atom and Clusters) of the Pt Catalyst by Atomic Layer Deposition Using Dimethyl ((3,4-eta) N,N-dimethyl-3-butene-1-amine-N) Platinum (DDAP) on the High-Surface-Area Substrate for Hydrogen Evolution Reaction. Advanced Materials Interfaces, 8(3), 2001508. doi: 10.1002/admi.202001508
- Wiley-VCH Verlag
- View : 477
- Download : 0
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