DGIST Scholar: Search

DGIST Scholar

Results 1-1 of 1 (Search time: 0.001 seconds).

Issue Date	Title Author(s) Journal	View
2021-07-06	Atomic layer deposition of RuO2 using a new metalorganic precursor as a diffusion barrier for Ru interconnect Kim, Youn-Hye ; Kotsugi, Yohei ; Cheon, Taehoon ; Ramesh, Rahul ; Kim, Soo-Hyun 24th Annual IEEE International Interconnect Technology Conference, IITC 2021, 2021-07-06	18

DGIST

DGIST Scholar was built with support from the OAK distribution project by the National Library of Korea.

You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.

Library Services Team, DGIST 333. Techno Jungang-daero, Hyeonpung-myeon, Dalseong-gun, Daegu, 42988, Republic of Korea.