Ⅰ. INTRODUCTION 1 1.1 Background of TFT 1 1.1.1 Structure and operation principle 1 1.1.2 Various channel materials 3 1.2 Vertical TFT 6 1.2.1 Background of vertical TFT 6 Ⅱ. EXPERIMENTAL 16 2.1 Fabrication of metal micro-hole array vertical TFT 16 2.1.1 Metal micro-hole array with oxide passivation layer 20 2.1.2 Metal micro-hole array with PN passivation layer 23 Ⅲ. ELECTRICAL CHARACTERISTICS OF METAL MICRO-HOLE ARRAY VERTICAL TFT 26 3.1 Source metal with Ohmic or Schottky contact 26 3.2 Drain metal with Ohmic or Schottky contact 39 3.3 Characteristic change according to size or thickness 45 Ⅳ. ELECTRICAL CHARACTERISTICS DEPENDING ON VERTICAL TFT STRUCTURE 51 4.1 Metal micro-hole array with oxide passivation layer 51 4.2 Metal micro-hole array with PN passivation layer 56 Ⅴ. CONCLUSION 63