Full metadata record
DC Field | Value | Language |
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dc.contributor.author | Jin, Hyeong Min | - |
dc.contributor.author | Lee, Su Eon | - |
dc.contributor.author | Kim, Simon | - |
dc.contributor.author | Kim, Ju Young | - |
dc.contributor.author | Han, Young-Soo | - |
dc.contributor.author | Kim, Bong Hoon | - |
dc.date.accessioned | 2022-03-15T07:30:02Z | - |
dc.date.available | 2022-03-15T07:30:02Z | - |
dc.date.created | 2022-03-14 | - |
dc.date.issued | 2022-06 | - |
dc.identifier.issn | 0021-8995 | - |
dc.identifier.uri | http://hdl.handle.net/20.500.11750/16372 | - |
dc.description.abstract | Polymer self-assembly commonly suffers from retarded equilibrium structure formation caused by the large diffusion barrier of long-chain molecules. In particular, the defect annihilation kinetics of high-χ block copolymers (BCPs) are generally sluggish because of a slow inter-block chain diffusion process from strong inter-block segregation. Therefore, long-range order of high-χ BCPs still hard to be obtained by conventional approaches. Here, we introduce near-infrared laser photothermal treatment to effectively promote high-χ BCP self-assembly and demonstrating highly aligned nanoscale patterned structures on silicon substrates. Adequate molecular weight selection of high-χ PS-b-P2VP system enables one-time laser hot-zone annealing, resulting in highly ordered nanodomains along laser writing direction. Facile sub-sequential metal ion loading to P2VP cylinders enables the formation of highly aligned metal nanowires. Moreover, a commonly used silicon substrate without a photoabsorbing layer is employed as a photo-thermal substrate, demonstrating that the laser writing process is compatible with conventional semiconductor processes. © 2022 Wiley Periodicals LLC. | - |
dc.language | English | - |
dc.publisher | John Wiley & Sons Inc. | - |
dc.title | Directed high-χ block copolymer self-assembly by laser writing on silicon substrate | - |
dc.type | Article | - |
dc.identifier.doi | 10.1002/app.52291 | - |
dc.identifier.wosid | 000762094000001 | - |
dc.identifier.scopusid | 2-s2.0-85125368237 | - |
dc.identifier.bibliographicCitation | Journal of Applied Polymer Science, v.139, no.23 | - |
dc.description.isOpenAccess | FALSE | - |
dc.subject.keywordAuthor | block copolymer | - |
dc.subject.keywordAuthor | directed self-assembly | - |
dc.subject.keywordAuthor | photothermal effect | - |
dc.subject.keywordAuthor | self-assembly | - |
dc.subject.keywordPlus | TEMPERATURE | - |
dc.subject.keywordPlus | ALIGNMENT | - |
dc.subject.keywordPlus | ORDER | - |
dc.subject.keywordPlus | THIN-FILMS | - |
dc.subject.keywordPlus | NANOSTRUCTURES | - |
dc.subject.keywordPlus | MECHANISMS | - |
dc.subject.keywordPlus | SEPARATION | - |
dc.subject.keywordPlus | THICKNESS | - |
dc.citation.number | 23 | - |
dc.citation.title | Journal of Applied Polymer Science | - |
dc.citation.volume | 139 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Polymer Science | - |
dc.relation.journalWebOfScienceCategory | Polymer Science | - |
dc.type.docType | Article | - |
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