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dc.contributor.author Shin, Jeong Hee -
dc.contributor.author Im, Jaehan -
dc.contributor.author Choi, Ji Woong -
dc.contributor.author Kim, Hyun Sik -
dc.contributor.author Sohn, Jung Inn -
dc.contributor.author Cha, Seung Nam -
dc.contributor.author Jang, Jae Eun -
dc.date.available 2017-05-11T01:41:14Z -
dc.date.created 2017-04-10 -
dc.date.issued 2016-06 -
dc.identifier.issn 0008-6223 -
dc.identifier.uri http://hdl.handle.net/20.500.11750/1639 -
dc.description.abstract Ultra-fast diode structures based on non-semiconductive materials employing tunneling mechanism have been investigated. Applying the structurally asymmetric effect of multi-wall carbon nanotube (MWCNT) to a vertical metal-insulator-MWCNT (MIC) tunneling diode structure, the 'on-off' ratio (∼104) and the current density (38.2 MA/cm2) are drastically enhanced compared to those of conventional metal-insulator-metal (MIM) tunneling diodes. The electrical characteristics are stable up to 423 K. Experimentally, rectifying performance of the MIC diode is good up to 10 MHz and the cut-off frequency of the MIC diode is estimated to be 6.47 THz. The growth process of MWCNT is more controllable for the number and the position than that of SWCNT. Therefore, it has a high probability of realization. The vertically aligned single MWCNT design can guarantee an ultra-high integration density, as well. Therefore, the MIC diode can be applied to various high frequency applications, such as communication devices, high speed electrical switches, and high performance control process units (CPUs), or other new concept devices. © 2016 Elsevier Ltd. -
dc.publisher PERGAMON-ELSEVIER SCIENCE LTD -
dc.title Ultrafast metal-insulator-multi-wall carbon nanotube tunneling diode employing asymmetrical structure effect -
dc.type Article -
dc.identifier.doi 10.1016/j.carbon.2016.02.035 -
dc.identifier.scopusid 2-s2.0-84960929817 -
dc.identifier.bibliographicCitation Carbon, v.102, pp.172 - 180 -
dc.subject.keywordPlus Asymmetrical Structures -
dc.subject.keywordPlus BARRIER -
dc.subject.keywordPlus CARBON NANOTUBES -
dc.subject.keywordPlus CHemICAL-VAPOR-DEPOSITION -
dc.subject.keywordPlus Communication Device -
dc.subject.keywordPlus Conventional Metals -
dc.subject.keywordPlus Diodes -
dc.subject.keywordPlus Electrical Characteristic -
dc.subject.keywordPlus GRAPHENE ELECTRODES -
dc.subject.keywordPlus High-Frequency Applications -
dc.subject.keywordPlus High Performance Control -
dc.subject.keywordPlus Metal Insulator Boundaries -
dc.subject.keywordPlus METALS -
dc.subject.keywordPlus Mim Devices -
dc.subject.keywordPlus Multi Wall Carbon Nanotube(Mwcnt) -
dc.subject.keywordPlus Multiwalled Carbon Nanotubes (MWCN) -
dc.subject.keywordPlus N-JUNCTION DIODES -
dc.subject.keywordPlus NANOTUBES -
dc.subject.keywordPlus Power Semiconductor Diodes -
dc.subject.keywordPlus Program Processors -
dc.subject.keywordPlus Tunnel Diodes -
dc.subject.keywordPlus Tunneling Mechanism -
dc.subject.keywordPlus Yarn -
dc.citation.endPage 180 -
dc.citation.startPage 172 -
dc.citation.title Carbon -
dc.citation.volume 102 -

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