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Division of Nanotechnology
1. Journal Articles
Gate voltage and drain current stress instabilities in amorphous In-Ga-Zn-O thin-film transistors with an asymmetric graphene electrode
Kim, Joonwoo
;
Myung, Sung
;
Noh, Hee-Yeon
;
Jeong, Soon Moon
;
Jeong, Jaewook
Department of Advanced Technology
Soft Optoelectronic Materials Lab.
1. Journal Articles
Division of Nanotechnology
1. Journal Articles
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Title
Gate voltage and drain current stress instabilities in amorphous In-Ga-Zn-O thin-film transistors with an asymmetric graphene electrode
Issued Date
2015-09
Citation
AIP Advances, v.5, no.9
Type
Article
Keywords
Amorphous Films
;
Channel Region
;
Contact Regions
;
Current Stress
;
Drain Current
;
Electrodes
;
GRAPHENE ELECTRODES
;
Graphite Electrodes
;
Positive Shift
;
Semiconducting Indium Compounds
;
Stretched Exponential
;
Subthreshold Slope
;
Thin Film Transistors
;
Thin Films
;
Threshold Voltage
;
Transparent Electrode
;
Zinc
;
Gallium
;
Graphene
ISSN
2158-3226
Abstract
The gate voltage and drain current stress instabilities in amorphous In-Ga-Zn-O thin-film transistors (a-IGZO TFTs) having an asymmetric graphene electrode structure are studied. A large positive shift in the threshold voltage, which is well fitted to a stretched-exponential equation, and an increase in the subthreshold slope are observed when drain current stress is applied. This is due to an increase in temperature caused by power dissipation in the graphene/a-IGZO contact region, in addition to the channel region, which is different from the behavior in a-IGZO TFTs with a conventional transparent electrode. © 2015 Author(s).
URI
http://hdl.handle.net/20.500.11750/2853
DOI
10.1063/1.4931084
Publisher
American Institute of Physics Publishing
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Jeong, Soon Moon
정순문
Department of Advanced Technology
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