Cited time in webofscience Cited time in scopus

Gate voltage and drain current stress instabilities in amorphous In-Ga-Zn-O thin-film transistors with an asymmetric graphene electrode

Title
Gate voltage and drain current stress instabilities in amorphous In-Ga-Zn-O thin-film transistors with an asymmetric graphene electrode
Author(s)
Kim, JoonwooMyung, SungNoh, Hee-YeonJeong, Soon MoonJeong, Jaewook
Issued Date
2015-09
Citation
AIP Advances, v.5, no.9
Type
Article
Keywords
Amorphous FilmsChannel RegionContact RegionsCurrent StressDrain CurrentElectrodesGalliumGrapheneGRAPHENE ELECTRODESGraphite ElectrodesPositive ShiftSemiconducting Indium CompoundsStretched ExponentialSubthreshold SlopeThin Film TransistorsThin FilmsThreshold VoltageTransparent ElectrodeZinc
ISSN
2158-3226
Abstract
The gate voltage and drain current stress instabilities in amorphous In-Ga-Zn-O thin-film transistors (a-IGZO TFTs) having an asymmetric graphene electrode structure are studied. A large positive shift in the threshold voltage, which is well fitted to a stretched-exponential equation, and an increase in the subthreshold slope are observed when drain current stress is applied. This is due to an increase in temperature caused by power dissipation in the graphene/a-IGZO contact region, in addition to the channel region, which is different from the behavior in a-IGZO TFTs with a conventional transparent electrode. © 2015 Author(s).
URI
http://hdl.handle.net/20.500.11750/2853
DOI
10.1063/1.4931084
Publisher
American Institute of Physics Publishing
Related Researcher
Files in This Item:
000362562100048.pdf

000362562100048.pdf

기타 데이터 / 2.7 MB / Adobe PDF download
Appears in Collections:
Division of Nanotechnology 1. Journal Articles
Division of Energy Technology 1. Journal Articles

qrcode

  • twitter
  • facebook
  • mendeley

Items in Repository are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE