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Methods and systems for planarizing workpieces, e.g., microelectronic workpieces
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dc.contributor.author 정하늘 -
dc.contributor.author 오세훈 -
dc.date.accessioned 2023-12-26T17:10:25Z -
dc.date.available 2023-12-26T17:10:25Z -
dc.identifier.uri http://hdl.handle.net/20.500.11750/46741 -
dc.description.abstract Planarizing workpieces, e.g., microelectronic workpieces, can employ a process indicator which is adapted to change an optical property in response to a planarizing condition. This process indicator may, for example, change color in response to reaching a particular temperature or in response to a particular shear force. In this example, the change in color of the process indicator may be correlated with an ongoing operating condition of the planarizing machine, such as excessive downforce, or correlated with an endpoint of the planarizing operation. Incorporating the process indicator in the planarizing medium, as proposed for select applications, can enable relatively simple, real-time collection of information which can be used to control a planarizing operation. -
dc.title Methods and systems for planarizing workpieces, e.g., microelectronic workpieces -
dc.title.alternative CONTROL DEVICE FOR PLANT AND CONTROLLING METHOD OF THE SAME -
dc.type Patent -
dc.identifier.bibliographicCitation 정하늘. Methods and systems for planarizing workpieces, e.g., microelectronic workpieces. -
dc.publisher.country US -
dc.identifier.patentApplicationNumber 11835929 -
dc.date.application 2007-08-08 -
dc.identifier.patentRegistrationNumber 07604527 -
dc.date.registration 2009-10-20 -
dc.contributor.assignee Jason B. Elledge -
dc.type.iprs 특허 -
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오세훈
Oh, Sehoon오세훈

Department of Robotics and Mechatronics Engineering

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