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Oxygen plasma treatment of HKUST-1 for porosity retention upon exposure to moisture

Title
Oxygen plasma treatment of HKUST-1 for porosity retention upon exposure to moisture
Authors
Bae, Jae YeonJung, Jin WooPark, Hyo YulCho, Chang HeePark, Jin Hee
DGIST Authors
Bae, Jae Yeon; Jung, Jin Woo; Cho, Chang HeePark, Jin Hee
Issue Date
2017-11
Citation
Chemical Communications, 53(89), 12100-12103
Type
Article
Article Type
Article
Keywords
METAL-ORGANIC FRAMEWORKSROOM-TEMPERATURECARBON-DIOXIDEACTIVATIONADSORPTIONSTABILITYWATERRESISTANTCAPTURESTORAGE
ISSN
1359-7345
Abstract
Despite their remarkable properties, metal-organic frameworks (MOFs) present vulnerable structures that are sensitive to moisture; therefore, their application to real field situations is challenging. Herein, an O2 plasma technique was introduced as a new method for the activation and protection of porosity in HKUST-1. In an unprecedented manner, O2 plasma-treated HKUST-1 retains its porosity after a long exposure to moisture as compared to pristine HKUST-1. Porosity retention was examined by N2 adsorption/desorption measurements of non-activated HKUST-1 after exposure to moisture. © 2017 The Royal Society of Chemistry.
URI
http://hdl.handle.net/20.500.11750/4853
DOI
10.1039/c7cc05845d
Publisher
Royal Society of Chemistry
Related Researcher
  • Author Cho, Chang Hee Nanoscale Optoelectronic Materials Laboratory
  • Research Interests Nanophotonics
Files:
There are no files associated with this item.
Collection:
Department of Emerging Materials ScienceNanoscale Optoelectronic Materials Laboratory1. Journal Articles
Department of Emerging Materials ScienceOrganic-Inorganic Hybrids Lab1. Journal Articles


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