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Cited 15 time in
Oxygen plasma treatment of HKUST-1 for porosity retention upon exposure to moisture
- Oxygen plasma treatment of HKUST-1 for porosity retention upon exposure to moisture
- Bae, Jaeyeon; Jung, Jin-Woo; Park, Hyo Yul; Cho, Chang-Hee; Park, Jinhee
- DGIST Authors
- Cho, Chang-Hee; Park, Jinhee
- Issue Date
- Chemical Communications, 53(89), 12100-12103
- Article Type
- METAL-ORGANIC FRAMEWORKS; ROOM-TEMPERATURE; CARBON-DIOXIDE; ACTIVATION; ADSORPTION; STABILITY; WATER; RESISTANT; CAPTURE; STORAGE
- Despite their remarkable properties, metal-organic frameworks (MOFs) present vulnerable structures that are sensitive to moisture; therefore, their application to real field situations is challenging. Herein, an O2 plasma technique was introduced as a new method for the activation and protection of porosity in HKUST-1. In an unprecedented manner, O2 plasma-treated HKUST-1 retains its porosity after a long exposure to moisture as compared to pristine HKUST-1. Porosity retention was examined by N2 adsorption/desorption measurements of non-activated HKUST-1 after exposure to moisture. © 2017 The Royal Society of Chemistry.
- Royal Society of Chemistry
- Related Researcher
Future Semiconductor Nanophotonics Laboratory
Semiconductor; Nanophotonics; Light-Matter Interaction
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