Department of Physics and Chemistry
Future Semiconductor Nanophotonics Laboratory
1. Journal Articles
Oxygen plasma treatment of HKUST-1 for porosity retention upon exposure to moisture
- Title
- Oxygen plasma treatment of HKUST-1 for porosity retention upon exposure to moisture
- Author(s)
- Bae, Jaeyeon ; Jung, Jin-Woo ; Park, Hyo Yul ; Cho, Chang-Hee ; Park, Jinhee
- DGIST Authors
- Cho, Chang-Hee ; Park, Jinhee
- Issued Date
- 2017-11
- Type
- Article
- Article Type
- Article
- Keywords
- METAL-ORGANIC FRAMEWORKS ; ROOM-TEMPERATURE ; CARBON-DIOXIDE ; ACTIVATION ; ADSORPTION ; STABILITY ; WATER ; RESISTANT ; CAPTURE ; STORAGE
- ISSN
- 1359-7345
- Abstract
- Despite their remarkable properties, metal-organic frameworks (MOFs) present vulnerable structures that are sensitive to moisture; therefore, their application to real field situations is challenging. Herein, an O2 plasma technique was introduced as a new method for the activation and protection of porosity in HKUST-1. In an unprecedented manner, O2 plasma-treated HKUST-1 retains its porosity after a long exposure to moisture as compared to pristine HKUST-1. Porosity retention was examined by N2 adsorption/desorption measurements of non-activated HKUST-1 after exposure to moisture. © 2017 The Royal Society of Chemistry.
- Publisher
- Royal Society of Chemistry
- Related Researcher
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Cho, Chang-Hee
- Research Interests Semiconductor; Nanophotonics; Light-Matter Interaction
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