Detail View

Topological band-order transition and quantum spin Hall edge engineering in functionalized X-Bi(111) (X = Ga, In, and Tl) bilayer
Citations

WEB OF SCIENCE

Citations

SCOPUS

Metadata Downloads

Title
Topological band-order transition and quantum spin Hall edge engineering in functionalized X-Bi(111) (X = Ga, In, and Tl) bilayer
Issued Date
2016-09
Citation
Kim, Youngjae. (2016-09). Topological band-order transition and quantum spin Hall edge engineering in functionalized X-Bi(111) (X = Ga, In, and Tl) bilayer. Scientific Reports, 6, 33395. doi: 10.1038/srep33395
Type
Article
Keywords
INSULATORSSURFACE
ISSN
2045-2322
Abstract
Functionalized X-Bi bilayers (X = Ga, In, and Tl) with halogens bonded on their both sides have been recently claimed to be the giant topological insulators due to the strong band inversion strengths. Employing the first-principles electronic structure calculation, we find the topological band order transition from the order p-p-s of the X-Bi bilayers with halogens on their both sides to the new order p-s-p of the bilayers (especially for X = Ga and In) with halogen on one side and hydrogen on the other side, where the asymmetric hydrogen bonding simulates the substrate. We further find that the p-s bulk band gap of the bilayer bearing the new order p-s-p sensitively depends on the electric field, which enables a meaningful engineering of the quantum spin Hall edge state by controlling the external electric field. © 2016 The Author(s).
URI
http://hdl.handle.net/20.500.11750/5082
DOI
10.1038/srep33395
Publisher
Nature Publishing Group
Show Full Item Record

File Downloads

공유

qrcode
공유하기

Related Researcher

이재동
Lee, JaeDong이재동

Department of Physics and Chemistry

read more

Total Views & Downloads