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Morphological Evolution of Silver Nanoparticles and Its Effect on Metal-Induced Chemical Etching of Silicon
- Morphological Evolution of Silver Nanoparticles and Its Effect on Metal-Induced Chemical Etching of Silicon
- Baek, Seong-Ho; Kong, Bo Hyun; Cho, Hyung Koun; Kim, Jae Hyun
- DGIST Authors
- Baek, Seong-Ho; Kim, Jae Hyun
- Issue Date
- Journal of Nanoscience and Nanotechnology, 13(5), 3715-3718
- Article Type
- Article; Proceedings Paper
- Chemical Etching; Chemistry; Conformation; Crystallization; Electroless Etchings; Electroless Plating; Electroless Plating Methods; Etching; Etching Direction.; Hydrofluoric Acid; Macromolecular Substances; Macromolecule; Mammals; Materials Testing; Metal Induced Chemical Etching; Metal Nanoparticle; Metal Nanoparticles; Methodology; Molecular Conformation; Molecular Imprinting; Morphological Evolution; Morphology; Nanowires; Oxidant Concentrations; Particle Size; Silicon; Silicon Nanowire; Silicon Nanowires; Silicon Wafers; Silver; Silver Nanoparticle; Silver Nanoparticles; Silver Nanoparticles (AgNps); Substrates; Surface Properties; Surface Property; Ultrastructure
- In this report, we have demonstrated the morphological evolution of the silver nanoparticles (AgNPs) by controlling the growth conditions and its effect on morphology of silicon (Si) during metalinduced electroless etching (MICE). Self-organized AgNPs with peculiarly shape were synthesized by an electroless plating method in a conventional aqueous hydrofluoric acid (HF) and silver nitrate (AgNO3) solution. AgNP nuclei were densely created on Si wafer surface, and they had a strong tendency to merge and form continuous metal films with increasing AgNO3 concentrations. Also, we have demonstrated that the fabrication of aligned Si nanowire (SiNW) arrays in large area of p-Si (111) substrates by MICE in a mixture of HF and hydrogen peroxide (H2O2) solution. We have found that the morphology of the initial AgNPs and oxidant concentration (H2O2) greatly influence on the shape of the SiNW etching profile. The morphological results showed that AgNP shapes were closely related to the etching direction of SiNWs, that is, the spherical AgNPs preferred to move vertical to the Si substrate, whereas non-spherical AgNPs changed their movement to the  directions. In addition, as the etching activity was increased at higher H2O 2 concentrations, AgNPs had a tendency to move from the original  direction to the energetically preferred  direction. Copyright © 2013 American Scientific Publishers.
- American Scientific Publishers
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