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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 김회준 | - |
| dc.contributor.author | 장일류 | - |
| dc.date.accessioned | 2026-01-01T02:10:24Z | - |
| dc.date.available | 2026-01-01T02:10:24Z | - |
| dc.identifier.uri | https://scholar.dgist.ac.kr/handle/20.500.11750/59316 | - |
| dc.title | 반도체 제조공정에서 발생하는 입자 측정을 위한 입자 저감 시스템 및 그 측정 방법 | - |
| dc.title.alternative | PARTICLE ABATEMENT SYSTEM FOR PARTICLE MEASUREMENT FROM SEMICONDUCTOR MANUFACTURING PROCESS AND MEASUREMENT METHOD THEREFOR | - |
| dc.type | Patent | - |
| dc.publisher.country | KO | - |
| dc.identifier.patentApplicationNumber | 10-2024-0078796 | - |
| dc.date.application | 2024-06-18 | - |
| dc.identifier.patentRegistrationNumber | 10-2891767 | - |
| dc.date.registration | 2025-11-24 | - |
| dc.contributor.assignee | (재)대구경북과학기술원(100/100) | - |
| dc.type.iprs | 특허 | - |
