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  Department of Robotics and Mechatronics Engineering Theses Master

In-situ Monitoring of Semiconductor Plasma Processes Using a QCM-based Diagnostic Platform

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dc.contributor.advisor 김회준 -
dc.contributor.author Ryoo See Jin -
dc.date.accessioned 2026-01-23T10:55:21Z -
dc.date.available 2026-01-23T10:55:21Z -
dc.date.issued 2026 -
dc.identifier.uri https://scholar.dgist.ac.kr/handle/20.500.11750/59673 -
dc.identifier.uri http://dgist.dcollection.net/common/orgView/200000947623 -
dc.description Piezoelectric resonator sensor, Plasma Etching, Real-time process monitoring, End Point Detection (EPD) -
dc.description.tableofcontents List of Contents
ABSTRACT i
List of Contents iii
List of Tables iv
List of Figures iv
I. Introduction 1
1) Need for Real-Time Monitoring 1
2) Principle and Applications of Quartz Crystal Microbalance 2
3) Plasma Technology in Semiconductor Manufacturing: Principles and Applications - 3 -
4) Limitations in Conventional Plasma Diagnostic Methods in Process Monitoring 4
II. Sensor Validation and Fabrication Process 6
1) Principle and Mechanism of Electrospray Deposition (ESD) 6
2) Simulation and Experimental Validation of Electrode Geometry Effects 8
3) Experimental Validation of QCM Mass Sensing and Electrode Integration 10
4) Thermal Characterization of the QCM Sensor 13
III. In-situ Plasma Monitoring Experiments 15
1) Experimental Setup for Plasma Etching 15
2) Sensor Response under Various Etching Conditions 17
IV. Results and Discussion 20
1) QCM Response under Different Pressure Conditions 20
2) Comparison between QCM and OES Results 21
3) Evaluation of Surface Observation 24
4) Step Height Analysis after Plasma Processing 26
5) Design of SAW Sensors for Wireless Sensing 28
V. Conclusion. 34
REFERENCES 36		 -
dc.format.extent 40 -
dc.language eng -
dc.publisher DGIST -
dc.title In-situ Monitoring of Semiconductor Plasma Processes Using a QCM-based Diagnostic Platform -
dc.title.alternative QCM 기반 진단 플랫폼을 이용한 반도체 플라즈마 공정의 실시간 모니터링 -
dc.type Thesis -
dc.identifier.doi 10.22677/THESIS.200000947623 -
dc.description.degree Master -
dc.contributor.department Department of Robotics and Mechatronics Engineering -
dc.date.awarded 2026-02-01 -
dc.publisher.location Daegu -
dc.description.database dCollection -
dc.citation XT.RM 유58 202602 -
dc.date.accepted 2026-01-19 -
dc.contributor.alternativeDepartment 로봇및기계전자공학과 -
dc.subject.keyword Piezoelectric resonator sensor, Plasma Etching, Real-time process monitoring, End Point Detection (EPD) -
dc.contributor.affiliatedAuthor Ryoo See Jin -
dc.contributor.affiliatedAuthor Hoe Joon Kim -
dc.contributor.alternativeName 유시진 -
dc.contributor.alternativeName Hoe Joon Kim -
dc.rights.embargoReleaseDate 2027-02-28 -
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