Title

In-situ Monitoring of Semiconductor Plasma Processes Using a QCM-based Diagnostic Platform

Alternative Title

QCM 기반 진단 플랫폼을 이용한 반도체 플라즈마 공정의 실시간 모니터링

DGIST Authors

Ryoo See Jin ; Hoe Joon Kim

Advisor

김회준

Issued Date

2026

Awarded Date

2026-02-01

Type

Thesis

Description

Piezoelectric resonator sensor, Plasma Etching, Real-time process monitoring, End Point Detection (EPD)

Table Of Contents

List of Contents
ABSTRACT i
List of Contents iii
List of Tables iv
List of Figures iv
I. Introduction 1
1) Need for Real-Time Monitoring 1
2) Principle and Applications of Quartz Crystal Microbalance 2
3) Plasma Technology in Semiconductor Manufacturing: Principles and Applications - 3 -
4) Limitations in Conventional Plasma Diagnostic Methods in Process Monitoring 4
II. Sensor Validation and Fabrication Process 6
1) Principle and Mechanism of Electrospray Deposition (ESD) 6
2) Simulation and Experimental Validation of Electrode Geometry Effects 8
3) Experimental Validation of QCM Mass Sensing and Electrode Integration 10
4) Thermal Characterization of the QCM Sensor 13
III. In-situ Plasma Monitoring Experiments 15
1) Experimental Setup for Plasma Etching 15
2) Sensor Response under Various Etching Conditions 17
IV. Results and Discussion 20
1) QCM Response under Different Pressure Conditions 20
2) Comparison between QCM and OES Results 21
3) Evaluation of Surface Observation 24
4) Step Height Analysis after Plasma Processing 26
5) Design of SAW Sensors for Wireless Sensing 28
V. Conclusion. 34
REFERENCES 36

URI

https://scholar.dgist.ac.kr/handle/20.500.11750/59673
http://dgist.dcollection.net/common/orgView/200000947623

DOI

10.22677/THESIS.200000947623

Degree

Master

Department

Department of Robotics and Mechatronics Engineering

Publisher

DGIST

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