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Department of Physics and Chemistry
Semiconductor Quantum Photonics Lab.
1. Journal Articles
Surface-diffusion-limited growth of atomically thin WS2 crystals from core-shell nuclei
Jo, Sunghwan
;
Jung, Jin-Woo
;
Baik, Jaeyoung
;
Kang, Jang-Won
;
Park, Il-Kyu
;
Bae, Tae-Sung
;
Chung, Hee-Suk
;
Cho, Chang-Hee
Department of Physics and Chemistry
Semiconductor Quantum Photonics Lab.
1. Journal Articles
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Title
Surface-diffusion-limited growth of atomically thin WS2 crystals from core-shell nuclei
Issued Date
2019-05
Citation
Jo, Sunghwan. (2019-05). Surface-diffusion-limited growth of atomically thin WS2 crystals from core-shell nuclei. Nanoscale, 11(18), 8706–8714. doi: 10.1039/c9nr01594a
Type
Article
Keywords
CHEMICAL-VAPOR-DEPOSITION
;
LIGHT-EMITTING-DIODES
;
EPITAXIAL-GROWTH
;
MOS2
;
WSE2
;
PHOTOLUMINESCENCE
;
MONOLAYERS
;
PROGRESS
ISSN
2040-3364
Abstract
Atomically thin transition metal dichalcogenides (TMDs) have recently attracted great attention since the unique and fascinating physical properties have been found in various TMDs, implying potential applications in next-generation devices. The progress towards developing new functional and high-performance devices based on TMDs, however, is limited by the difficulty in producing large-area monolayer TMDs due to a lack of knowledge of the growth processes of monolayer TMDs. In this work, we have investigated the growth processes of monolayer WS 2 crystals using a thermal chemical vapor deposition method, in which the growth conditions were adjusted in a systematic manner. It was found that, after forming WO 3 -WS 2 core-shell nanoparticles as nucleation sites on a substrate, the growth of three-dimensional WS 2 islands proceeds by ripening and crystallization processes. Lateral growth of monolayer WS 2 crystals subsequently occurs by the surface diffusion process of adatoms toward the step edge of the three-dimensional WS 2 islands. Our results provide understanding of the growth processes of monolayer WS 2 by using chemical vapor deposition methods. © 2019 The Royal Society of Chemistry.
URI
http://hdl.handle.net/20.500.11750/9855
DOI
10.1039/c9nr01594a
Publisher
Royal Society of Chemistry
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