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Article
Atomic-Layer-Deposited MoN x Thin Films on Three-Dimensional Ni Foam as Efficient Catalysts for the Electrochemical Hydrogen Evolution Reaction
  • Ramesh, Rahul ; 
  • Nandi, Dip K. ; 
  • Kim, Tae Hyun ; 
  • Cheon, Taehoon ; 
  • Oh, Jihun ; 
  • Kim, Soo-Hyun
  • 2019-05
  • Ramesh, Rahul. (2019-05). Atomic-Layer-Deposited MoN x Thin Films on Three-Dimensional Ni Foam as Efficient Catalysts for the Electrochemical Hydrogen Evolution Reaction. doi: 10.1021/acsami.8b20437
  • American Chemical Society
  • View : 887
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Enhanced activity of highly conformal and layered tin sulfide (SnSx) prepared by atomic layer deposition (ALD) on 3D metal scaffold towards high performance supercapacitor electrode

Article
Enhanced activity of highly conformal and layered tin sulfide (SnSx) prepared by atomic layer deposition (ALD) on 3D metal scaffold towards high performance supercapacitor electrode
  • Ansari, Mohd Zahid ; 
  • Parveen, Nazish ; 
  • Nandi, Dip K. ; 
  • Ramesh, Rahul ; 
  • Ansari, Sajid Ali ; 
  • Cheon, Taehoon ; 
  • Kim, Soo-Hyun
  • 2019-07
  • Ansari, Mohd Zahid. (2019-07). Enhanced activity of highly conformal and layered tin sulfide (SnSx) prepared by atomic layer deposition (ALD) on 3D metal scaffold towards high performance supercapacitor electrode. doi: 10.1038/s41598-019-46679-7
  • Nature Publishing Group
  • View : 1054
  • Download : 281
Article
Low temperature atomic layer deposited molybdenum nitride-Ni-foam composite: An electrode for efficient charge storage
  • Nandi, Dip K. ; 
  • Sahoo, Sumanta ; 
  • Kim, Tae Hyun ; 
  • Cheon, Tae Hoon ; 
  • Sinha, Soumyadeep ; 
  • Rahul, Ramesh ; 
  • Jang, Yu Jjin ; 
  • Bae, Jong Seong ; 
  • Heo, Jae Yeong ; 
  • Shim, Jae Jin ; 
    • et al
  • 2018-08
  • Nandi, Dip K. (2018-08). Low temperature atomic layer deposited molybdenum nitride-Ni-foam composite: An electrode for efficient charge storage. Electrochemistry Communications, 93, 114–118. doi: 10.1016/j.elecom.2018.07.003
  • Elsevier Inc.
  • View : 719
  • Download : 0
Article
Low-Temperature Atomic Layer Deposition of Highly Conformal Tin Nitride Thin Films for Energy Storage Devices
  • Ansari, Mohd Zahid ; 
  • Nandi, Dip K. ; 
  • Janicek, Petr ; 
  • Ansari, Sajid Ali ; 
  • Ramesh, Rahul ; 
  • Cheon, Taehoon ; 
  • Shong, Bonggeun ; 
  • Kim, Soo-Hyun
  • 2019-11
  • Ansari, Mohd Zahid. (2019-11). Low-Temperature Atomic Layer Deposition of Highly Conformal Tin Nitride Thin Films for Energy Storage Devices. ACS Applied Materials & Interfaces, 11(46), 43608–43621. doi: 10.1021/acsami.9b15790
  • American Chemical Society
  • View : 866
  • Download : 0
Article
New class of Zr precursor containing boratabenzene ligand enabling highly conformal wafer-scale zirconium dioxide thin films through atomic layer deposition
  • Ansari, Mohd Zahid ; 
  • Janicek, Petr ; 
  • Namgung, Sook ; 
  • Kim, Hyangil ; 
  • Nandi, Dip K. ; 
  • Cheon, Taehoon ; 
  • Siddiqui, Masoom Raza ; 
  • Imran, Muhammad ; 
  • Jang, Yujin ; 
  • Bae, Jong-Seong ; 
    • et al
  • 2024-03
  • Ansari, Mohd Zahid. (2024-03). New class of Zr precursor containing boratabenzene ligand enabling highly conformal wafer-scale zirconium dioxide thin films through atomic layer deposition. Surfaces and Interfaces, 46. doi: 10.1016/j.surfin.2024.104014
  • Elsevier
  • View : 309
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Article
Preparation of wafer-scale highly conformalamorphous hafnium dioxide thin films by atomic layer deposition using a thermally stable boratabenzene ligand-containing hafnium precursor
  • Ansari, Mohd Zahid ; 
  • Janicek, Petr ; 
  • Park, Ye Jin ; 
  • NamGung, Sook ; 
  • Cho, Bo Yeon ; 
  • Nandi, Dip K. ; 
  • Jang, Yujin ; 
  • Bae, Jong-Seong ; 
  • Hong, Tae Eun ; 
  • Cheon, Taehoon ; 
    • et al
  • 2023-05
  • Ansari, Mohd Zahid. (2023-05). Preparation of wafer-scale highly conformalamorphous hafnium dioxide thin films by atomic layer deposition using a thermally stable boratabenzene ligand-containing hafnium precursor. Applied Surface Science, 620. doi: 10.1016/j.apsusc.2023.156834
  • Elsevier BV
  • View : 212
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Article
Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
  • Nandi, Dip K. ; 
  • Yeo, Seungmin ; 
  • Ansari, Mohd Zahid ; 
  • Sinha, Soumyadeep ; 
  • Cheon, Taehoon ; 
  • Kwon, Jiseok ; 
  • Kim, Hyungjun ; 
  • Heo, Jaeyeong ; 
  • Song, Taeseup ; 
  • Kim, Soo-Hyun
  • 2019-11
  • Nandi, Dip K. (2019-11). Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery. doi: 10.1016/j.electacta.2019.134766
  • Elsevier Ltd
  • View : 829
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Article
Ultralow Loading (Single-Atom and Clusters) of the Pt Catalyst by Atomic Layer Deposition Using Dimethyl ((3,4-eta) N,N-dimethyl-3-butene-1-amine-N) Platinum (DDAP) on the High-Surface-Area Substrate for Hydrogen Evolution Reaction
  • Ramesh, Rahul ; 
  • Han, Seungmin ; 
  • Nandi, Dip K. ; 
  • Sawant, Sandesh Y. ; 
  • Kim, Deok Hyun ; 
  • Cheon, Taehoon ; 
  • Cho, Moo Hwan ; 
  • Harada, Ryosuke ; 
  • Shigetomi, Toshiyuki ; 
  • Suzuki, Kazuharu ; 
    • et al
  • 2021-02
  • Ramesh, Rahul. (2021-02). Ultralow Loading (Single-Atom and Clusters) of the Pt Catalyst by Atomic Layer Deposition Using Dimethyl ((3,4-eta) N,N-dimethyl-3-butene-1-amine-N) Platinum (DDAP) on the High-Surface-Area Substrate for Hydrogen Evolution Reaction. Advanced Materials Interfaces, 8(3), 2001508. doi: 10.1002/admi.202001508
  • Wiley-VCH Verlag
  • View : 505
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