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Article
Atomic layer deposition of Ru thin film using N-2/H-2 plasma as a reactant
  • Hong, TE[Hong, Tae Eun] ; 
  • Mun, KY[Mun, Ki-Yeung] ; 
  • Choi, SK[Choi, Sang-Kyung] ; 
  • Park, JY[Park, Ji-Yoon] ; 
  • Kim, SH[Kim, Soo-Hyun] ; 
  • Cheon, T[Cheon, Taehoon] ; 
  • Kim, WK[Kim, Woo Kyoung] ; 
  • Lim, BY[Lim, Byoung-Yong] ; 
  • Kim, S[Kim, Sunjung]
  • 2012-07-31
  • Hong, TE[Hong, Tae Eun]. (2012-07-31). Atomic layer deposition of Ru thin film using N-2/H-2 plasma as a reactant. doi: 10.1016/j.tsf.2012.05.069
  • ELSEVIER SCIENCE SA
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Article
Cu(InGa)Se-2 Photovoltaic Absorber Formation by Spray-Deposition of Aqueous Precursors Followed by Selenization
  • 2015-08
  • Park, Jin Woo. (2015-08). Cu(InGa)Se-2 Photovoltaic Absorber Formation by Spray-Deposition of Aqueous Precursors Followed by Selenization. Journal of Nanoelectronics and Optoelectronics, 10(4), 574–577. doi: 10.1166/jno.2015.1804
  • American Scientific Publishers
  • View : 867
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Optical and photoelectric properties of Mn-doped ZnS thin film on a flexible indium-tin-oxide/polyethylene terephthalate substrate prepared by pulsed laser deposition

Article
Optical and photoelectric properties of Mn-doped ZnS thin film on a flexible indium-tin-oxide/polyethylene terephthalate substrate prepared by pulsed laser deposition
  • 2016-07
  • Choi, Byeongdae. (2016-07). Optical and photoelectric properties of Mn-doped ZnS thin film on a flexible indium-tin-oxide/polyethylene terephthalate substrate prepared by pulsed laser deposition. Optical Materials Express, 6(7), 2336–2341. doi: 10.1364/OME.6.002336
  • OSA - The Optical Society
  • View : 1163
  • Download : 169
Article
Organic Photovoltaic Cells Using Indium Zinc Tin Oxide Electrode
  • Kim, Ki Hwan ; 
  • Putri, Maryane A. ; 
  • Lee, Hye Ji ; 
  • Noviyana, Imas ; 
  • Koo, Chang Young ; 
  • Lee, Jung-A ; 
  • Kim, Jeong-Joo ; 
  • Jung, Young Joon ; 
  • Lee, Youngu ; 
  • Kim, Hae-Kyoung ; 
    • et al
  • 2017-06
  • Kim, Ki Hwan. (2017-06). Organic Photovoltaic Cells Using Indium Zinc Tin Oxide Electrode. Journal of Nanoscience and Nanotechnology, 17(6), 4292–4296. doi: 10.1166/jnn.2017.13380
  • American Scientific Publishers
  • View : 1094
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Article
Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
  • Choi, Sang Kyung ; 
  • Kim, Han Gil ; 
  • Kim, Jun Beam ; 
  • Cheon, Tae Hoon ; 
  • Seo, Jong Hyun ; 
  • Kim, Soo Hyun
  • 2015
  • Choi, Sang Kyung. (2015). Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization. doi: 10.1016/j.tsf.2015.05.033
  • Elsevier
  • View : 777
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