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Issue Date	Title Author(s) Journal	View
2020-09	Conformal and Ultra Shallow Junction Formation Achieved Using a Pulsed-Laser Annealing Process Integrated With a Modified Plasma Assisted Doping Method Baik, Seunghun ; Kwon, Dong-Jae ; Kang, Hongki ; Jang, Jae Eun ; Jang, Jaewon ; Kim, Y. S. ; Kwon, Hyuk-Jun IEEE Access, v.8, pp.172166 - 172174, 2020-09	474
2023-07	Nonvolatile flash memory device with ferroelectric blocking layer via in situ ALD process Kim, Dongsu ; Song, Chong-Myeong ; Heo, Su Jin ; Pyo, Goeun ; Kim, Dongha ; Lee, Ji Hwan ; Park, Kyung-Ho ; Lee, Shinbuhm ; Kwon, Hyuk-Jun ; Jang, Jae Eun Applied Physics Letters, v.123, no.4, 2023-07	186

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