According to one aspect of the present invention, an intaglio transfer method is provided, the method comprising the steps of: (S100) applying a nanowire material to a stamp; (S200) bringing the stamp into contact with a pattern-formed intaglio trench and separating same so as to transfer the pattern formed of the nanowire material to the stamp; and (S300) bringing the pattern-transferred stamp into contact with a substrate and separating same so as to transfer the pattern formed of the nanowire material to the substrate.
