Advances in Photopatterning of Quantum Dots: Mechanisms, Materials, and Device Applications

Abstract

The precise patterning of quantum dots (QDs) is crucial for integrating advanced optoelectronic devices, including quantum dot light-emitting diodes (QLEDs) and photodetectors. However, conventional patterning techniques often suffer from poor film uniformity and degradation of the optical and electronic properties of QDs. Recently, direct optical lithography has emerged as a powerful alternative, enabling high-resolution patterning while better preserving QD integrity. In this review, we summarize the representative photopatterning mechanisms, including ligand exchange, ligand cross-linking, ligand decomposition, and ligand desorption and discuss the associated material considerations, including QDs, surface ligands, and charge-transport layers. We further highlight recent breakthroughs in applying these strategies to QLEDs and photodetectors. Finally, we outline the remaining challenges - including solubility control, industrial scalability, photodamage mitigation, and the optimization of processing conditions - and propose potential strategies for enhancing patterning quality, device performance, and manufacturability.