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Issue Date Title Author(s) Journal View
2015-09

Cho, Y[Cho, Yuljae] Park, JB[Park, Jong Bae] Kim, BS[Kim, Byung-Sung] Lee, J[Lee, Juwon] Hong, WK[Hong, Woong-Ki] Park, IK[Park, Il-Kyu] Jang, JE[Jang, Jae Eun] Sohn, JI[Sohn, Jung Inn] Cha, S[Cha, SeungNam] Kim, JM[Kim, Jong Min]

Elsevier B.V., 2015-09

728
2020-09

Conformal and Ultra Shallow Junction Formation Achieved Using a Pulsed-Laser Annealing Process Integrated With a Modified Plasma Assisted Doping Method

Baik, Seunghun Kwon, Dong-Jae Kang, Hongki Jang, Jae Eun Jang, Jaewon Kim, Y. S. Kwon, Hyuk-Jun

IEEE Access, v.8, pp.172166 - 172174, 2020-09

474
2021-10

Kim, Dongsu Heo, Su Jin Pyo, Goeun Choi, Hongsoo Kwon, Hyuk-Jun Jang, Jae Eun

Institute of Electrical and Electronics Engineers Inc., 2021-10

459
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