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A Unified Understanding of the Thickness-Dependent Bandgap Transition in Hexagonal Two-Dimensional Semiconductors
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Title
A Unified Understanding of the Thickness-Dependent Bandgap Transition in Hexagonal Two-Dimensional Semiconductors
Issued Date
2016-02-18
Citation
Kang, Joongoo. (2016-02-18). A Unified Understanding of the Thickness-Dependent Bandgap Transition in Hexagonal Two-Dimensional Semiconductors. Journal of Physical Chemistry Letters, 7(4), 597–602. doi: 10.1021/acs.jpclett.5b02687
Type
Article
Keywords
AUGMENTED-WAVE METHODBandgap TransitionCalculationsCrystal SymmetryDER-WAALS HETEROSTRUCTURESEnergy GapFirst-Principles CalculationHexagonal Boron Nitride (h-BN)Hexagonal LatticeHigh-Symmetry PointsLAYER MOS2Layered SemiconductorsMETAL DICHALCOGENIDESMONOLAYER MOS2Symmetry AnalysisTransition Metal DichalcogenidesTransition MetalsTwo-Dimensional Semiconductors
ISSN
1948-7185
Abstract
Many important layered semiconductors, such as hexagonal boron nitride (hBN) and transition-metal dichalcogenides (TMDs), are derived from a hexagonal lattice. A single layer of such hexagonal semiconductors generally has a direct bandgap at the high-symmetry point K, whereas it becomes an indirect, optically inactive semiconductor as the number of layers increases to two or more. Here, taking hBN and MoS2 as examples, we reveal the microscopic origin of the direct-to-indirect bandgap transition of hexagonal layered materials. Our symmetry analysis and first-principles calculations show that the bandgap transition arises from the lack of the interlayer orbital couplings for the band-edge states at K, which are inherently weak because of the crystal symmetries of hexagonal layered materials. Therefore, it is necessary to judiciously break the underlying crystal symmetries to design more optically active, multilayered semiconductors from hBN or TMDs. © 2016 American Chemical Society.
URI
http://hdl.handle.net/20.500.11750/2550
DOI
10.1021/acs.jpclett.5b02687
Publisher
American Chemical Society
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강준구
Kang, Joongoo강준구

Department of Physics and Chemistry

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