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Showing results 1 to 26 of 26

Article
A bilayer diffusion barrier of Ru/WSixNy for advanced Cu interconnects
  • Eom, Tae-Kwang ; 
  • Sari, Windu ; 
  • Cheon, Taehoon ; 
  • Kim, Soo-Hyun ; 
  • Kim, Woo Kyoung
  • 2012-10
  • Eom, Tae-Kwang. (2012-10). A bilayer diffusion barrier of Ru/WSixNy for advanced Cu interconnects. doi: 10.1016/j.tsf.2012.03.068
  • Elsevier BV
  • View : 879
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Article
Advanced Atomic Layer Modulation Based Highly Homogeneous PtRu Precious Metals Alloy Thin Films
  • Son, Yeseul ; 
  • Kim, Sang Bok ; 
  • Mohapatra, Debananda ; 
  • Cheon, Taehoon ; 
  • Kim, Soo-Hyun
  • 2025-08
  • Advanced Science, v.12, no.29
  • Wiley
  • View : 100
  • Download : 0
Article
Atomic Layer Deposition of Ru Thin Films Using a Ru(0) Metallorganic Precursor and O-2
  • Hong, Tae Eun ; 
  • Choi, Sang-Hyeok ; 
  • Yeo, Seungmin ; 
  • Park, Ji-Yoon ; 
  • Kim, Soo-Hyun ; 
  • Cheon, Taehoon ; 
  • Kim, Hoon ; 
  • Kim, Min-Kyu ; 
  • Kim, Hyungjun
  • 2013-01
  • Hong, Tae Eun. (2013-01). Atomic Layer Deposition of Ru Thin Films Using a Ru(0) Metallorganic Precursor and O-2. ECS Journal of Solid State Science and Technology, 2(3), P47–P53. doi: 10.1149/2.001303jss
  • Electrochemical Society, Inc.
  • View : 579
  • Download : 0
Conference
Atomic layer deposition of RuO2 using a new metalorganic precursor as a diffusion barrier for Ru interconnect
  • Kim, Youn-Hye ; 
  • Kotsugi, Yohei ; 
  • Cheon, Taehoon ; 
  • Ramesh, Rahul ; 
  • Kim, Soo-Hyun
  • 2021-07-06
  • Kim, Youn-Hye. (2021-07-06). Atomic layer deposition of RuO2 using a new metalorganic precursor as a diffusion barrier for Ru interconnect. 24th Annual IEEE International Interconnect Technology Conference, IITC 2021. doi: 10.1109/IITC51362.2021.9537498
  • Institute of Electrical and Electronics Engineers Inc.
  • View : 131
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Article
Atomic layer deposition of ruthenium (Ru) thin films using ethylbenzen-cyclohexadiene Ru(0) as a seed layer for copper metallization
  • Yeo, Seungmin ; 
  • Choi, Sang-Hyeok ; 
  • Park, Ji-Yoon ; 
  • Kim, Soo-Hyun ; 
  • Cheon, Taehoon ; 
  • Lim, Byoung-Yong ; 
  • Kim, Sunjung
  • 2013-11
  • Yeo, Seungmin. (2013-11). Atomic layer deposition of ruthenium (Ru) thin films using ethylbenzen-cyclohexadiene Ru(0) as a seed layer for copper metallization. doi: 10.1016/j.tsf.2013.03.074
  • Elsevier BV
  • View : 731
  • Download : 0
Article
Atomic Layer Modulation of Multicomponent Thin Films through Combination of Experimental and Theoretical Approaches
  • Nguyen, Chi Thang ; 
  • Gu, Bonwook ; 
  • Cheon, Taehoon ; 
  • Park, Jeongwoo ; 
  • Khan, Mohammad Rizwan ; 
  • Kim, Soo-Hyun ; 
  • Shong, Bonggeun ; 
  • Lee, Han-Bo-Ram
  • 2021-06
  • Nguyen, Chi Thang. (2021-06). Atomic Layer Modulation of Multicomponent Thin Films through Combination of Experimental and Theoretical Approaches. Chemistry of Materials, 33(12), 4435–4444. doi: 10.1021/acs.chemmater.1c00508
  • American Chemical Society
  • View : 365
  • Download : 0
Article
Atomic-Layer-Deposited MoN x Thin Films on Three-Dimensional Ni Foam as Efficient Catalysts for the Electrochemical Hydrogen Evolution Reaction
  • Ramesh, Rahul ; 
  • Nandi, Dip K. ; 
  • Kim, Tae Hyun ; 
  • Cheon, Taehoon ; 
  • Oh, Jihun ; 
  • Kim, Soo-Hyun
  • 2019-05
  • Ramesh, Rahul. (2019-05). Atomic-Layer-Deposited MoN x Thin Films on Three-Dimensional Ni Foam as Efficient Catalysts for the Electrochemical Hydrogen Evolution Reaction. doi: 10.1021/acsami.8b20437
  • American Chemical Society
  • View : 862
  • Download : 0
Article
Characteristics ofMoSe(2) formation during rapid thermal processing ofMo-coated glass
  • Lee, Soobin ; 
  • Koo, Jaseok ; 
  • Kim, Sammi ; 
  • Kim, Soo-Hyun ; 
  • Cheon, Taehoon ; 
  • Oh, Jong Seok ; 
  • Kim, Suk Jin ; 
  • Kim, Woo Kyoung
  • 2013-05
  • Lee, Soobin. (2013-05). Characteristics ofMoSe(2) formation during rapid thermal processing ofMo-coated glass. doi: 10.1016/j.tsf.2012.10.035
  • Elsevier
  • View : 640
  • Download : 0
Article
Cobalt titanium nitride amorphous metal alloys by atomic layer deposition
  • Nam, Taewook ; 
  • Lee, Chang Wan ; 
  • Cheon, Taehoon ; 
  • Lee, Woo Jae ; 
  • Kim, Soo-Hyun ; 
  • Kwon, Se-Hun ; 
  • Lee, Han-Bo-Ram ; 
  • Kim, Hyungjun
  • 2018-03
  • Nam, Taewook. (2018-03). Cobalt titanium nitride amorphous metal alloys by atomic layer deposition. Journal of Alloys and Compounds, 737, 684–692. doi: 10.1016/j.jallcom.2017.12.023
  • Elsevier BV
  • View : 533
  • Download : 0
Article
Development of RuS2 for near-infrared photodetector by atomic layer deposition and post-sulfurization
  • Nakazawa, Tatsuya ; 
  • Kim, Donghyun ; 
  • Kim, Jaehyeok ; 
  • Kotsugi, Yohei ; 
  • Cheon, Taehoon ; 
  • Chung, Seung-Min ; 
  • Kim, Soo-Hyun ; 
  • Kim, Hyungjun
  • 2022-09
  • Nakazawa, Tatsuya. (2022-09). Development of RuS2 for near-infrared photodetector by atomic layer deposition and post-sulfurization. Rare Metals, 41(9), 3086–3099. doi: 10.1007/s12598-022-02012-2
  • University of Science and Technology Beijing
  • View : 336
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Enhanced activity of highly conformal and layered tin sulfide (SnSx) prepared by atomic layer deposition (ALD) on 3D metal scaffold towards high performance supercapacitor electrode

Article
Enhanced activity of highly conformal and layered tin sulfide (SnSx) prepared by atomic layer deposition (ALD) on 3D metal scaffold towards high performance supercapacitor electrode
  • Ansari, Mohd Zahid ; 
  • Parveen, Nazish ; 
  • Nandi, Dip K. ; 
  • Ramesh, Rahul ; 
  • Ansari, Sajid Ali ; 
  • Cheon, Taehoon ; 
  • Kim, Soo-Hyun
  • 2019-07
  • Ansari, Mohd Zahid. (2019-07). Enhanced activity of highly conformal and layered tin sulfide (SnSx) prepared by atomic layer deposition (ALD) on 3D metal scaffold towards high performance supercapacitor electrode. doi: 10.1038/s41598-019-46679-7
  • Nature Publishing Group
  • View : 1019
  • Download : 257
Article
Functionalization of Si3N4 with an aldehyde inhibitor for area selective deposition of HfO2 and SiO2
  • Lee, Byungchan ; 
  • Shim, Seungwon ; 
  • Trinh, Ngoc Le ; 
  • Patil, Aravind H. ; 
  • Nguyen, Chi Thang ; 
  • Cheon, Taehoon ; 
  • Kim, Soo-Hyun ; 
  • Kang, Youngho ; 
  • Lee, Han-Bo-Ram
  • 2025-10
  • Journal of Materials Chemistry C, v.13, no.37, pp.19316 - 19329
  • Royal Society of Chemistry
  • View : 10
  • Download : 0
Article
Growth of highly conformal ruthenium-oxide thin films with enhanced nucleation by atomic layer deposition
  • Park, Ji-Yoon ; 
  • Yeo, Seungmin ; 
  • Cheon, Taehoon ; 
  • Kim, Soo-Hyun ; 
  • Kim, Min-Kyu ; 
  • Kim, Hyungjun ; 
  • Hong, Tae Eun ; 
  • Lee, Do-Joong
  • 2014-10-15
  • Park, Ji-Yoon. (2014-10-15). Growth of highly conformal ruthenium-oxide thin films with enhanced nucleation by atomic layer deposition. Journal of Alloys and Compounds, 610, 529–539. doi: 10.1016/j.jallcom.2014.04.186
  • Elsevier
  • View : 784
  • Download : 0
Article
Growth of Highly Conformal TiCx Films Using Atomic Layer Deposition Technique
  • Hong, Tae Eun ; 
  • Choi, Sang-Kyung ; 
  • Kim, Soo-Hyun ; 
  • Cheon, Taehoon
  • 2013-04
  • Hong, Tae Eun. (2013-04). Growth of Highly Conformal TiCx Films Using Atomic Layer Deposition Technique. Journal of the American Ceramic Society, 96(4), 1060–1062. doi: 10.1111/jace.12289
  • Wiley Blackwell
  • View : 595
  • Download : 0
Article
Highly Conductive Ultrathin Niobium Carbide Thin Films as Next-Generation Diffusion Barriers for Cu and Ru Interconnects Prepared by Plasma-Enhanced Atomic Layer Deposition
  • Park, Chaehyun ; 
  • Kweon, Minjeong ; 
  • Mohapatra, Debananda ; 
  • Cheon, Taehoon ; 
  • Bae, Jong-Seong ; 
  • Jeong, Daeyoon ; 
  • Jang, Hyunwoo ; 
  • Shim, Seungwon ; 
  • Park, Young-Bae ; 
  • Kang, Youngho ; 
    • et al
  • 2025-06
  • Park, Chaehyun. (2025-06). Highly Conductive Ultrathin Niobium Carbide Thin Films as Next-Generation Diffusion Barriers for Cu and Ru Interconnects Prepared by Plasma-Enhanced Atomic Layer Deposition. Chemistry of Materials, 37(13), 4743–4757. doi: 10.1021/acs.chemmater.5c00557
  • American Chemical Society
  • View : 1061
  • Download : 0
Article
Layer Engineered MXene Empowered Wearable Pressure Sensors for Non-Invasive Vital Human–Machine Interfacing Healthcare Monitoring
  • Mohapatra, Debananda ; 
  • Byun, Jeong Eun ; 
  • Ansari, Mohd Zahid ; 
  • Kim, Haekyoung ; 
  • Cheon, Taehoon ; 
  • Jang, Jongmoon ; 
  • Cho, Young-Rae ; 
  • Lee, Jung Woo ; 
  • Kim, Soo-Hyun
  • 2023-12
  • Mohapatra, Debananda. (2023-12). Layer Engineered MXene Empowered Wearable Pressure Sensors for Non-Invasive Vital Human–Machine Interfacing Healthcare Monitoring. Advanced Materials Technologies, 8(24). doi: 10.1002/admt.202301175
  • Wiley
  • View : 66
  • Download : 0
Article
Low-Temperature Atomic Layer Deposition of Highly Conformal Tin Nitride Thin Films for Energy Storage Devices
  • Ansari, Mohd Zahid ; 
  • Nandi, Dip K. ; 
  • Janicek, Petr ; 
  • Ansari, Sajid Ali ; 
  • Ramesh, Rahul ; 
  • Cheon, Taehoon ; 
  • Shong, Bonggeun ; 
  • Kim, Soo-Hyun
  • 2019-11
  • Ansari, Mohd Zahid. (2019-11). Low-Temperature Atomic Layer Deposition of Highly Conformal Tin Nitride Thin Films for Energy Storage Devices. ACS Applied Materials & Interfaces, 11(46), 43608–43621. doi: 10.1021/acsami.9b15790
  • American Chemical Society
  • View : 842
  • Download : 0
Article
New class of Zr precursor containing boratabenzene ligand enabling highly conformal wafer-scale zirconium dioxide thin films through atomic layer deposition
  • Ansari, Mohd Zahid ; 
  • Janicek, Petr ; 
  • Namgung, Sook ; 
  • Kim, Hyangil ; 
  • Nandi, Dip K. ; 
  • Cheon, Taehoon ; 
  • Siddiqui, Masoom Raza ; 
  • Imran, Muhammad ; 
  • Jang, Yujin ; 
  • Bae, Jong-Seong ; 
    • et al
  • 2024-03
  • Ansari, Mohd Zahid. (2024-03). New class of Zr precursor containing boratabenzene ligand enabling highly conformal wafer-scale zirconium dioxide thin films through atomic layer deposition. Surfaces and Interfaces, 46. doi: 10.1016/j.surfin.2024.104014
  • Elsevier
  • View : 287
  • Download : 0
Article
Preparation of wafer-scale highly conformalamorphous hafnium dioxide thin films by atomic layer deposition using a thermally stable boratabenzene ligand-containing hafnium precursor
  • Ansari, Mohd Zahid ; 
  • Janicek, Petr ; 
  • Park, Ye Jin ; 
  • NamGung, Sook ; 
  • Cho, Bo Yeon ; 
  • Nandi, Dip K. ; 
  • Jang, Yujin ; 
  • Bae, Jong-Seong ; 
  • Hong, Tae Eun ; 
  • Cheon, Taehoon ; 
    • et al
  • 2023-05
  • Ansari, Mohd Zahid. (2023-05). Preparation of wafer-scale highly conformalamorphous hafnium dioxide thin films by atomic layer deposition using a thermally stable boratabenzene ligand-containing hafnium precursor. Applied Surface Science, 620. doi: 10.1016/j.apsusc.2023.156834
  • Elsevier BV
  • View : 196
  • Download : 0

Process Controlled Ruthenium on 2D Engineered V-MXene via Atomic Layer Deposition for Human Healthcare Monitoring

Article
Process Controlled Ruthenium on 2D Engineered V-MXene via Atomic Layer Deposition for Human Healthcare Monitoring
  • Mohapatra, Debananda ; 
  • Shin, Yujin ; 
  • Ansari, Mohd Zahid ; 
  • Kim, Youn-Hye ; 
  • Park, Ye Jin ; 
  • Cheon, Taehoon ; 
  • Kim, Haekyoung ; 
  • Lee, Jung Woo ; 
  • Kim, Soo-Hyun
  • 2023-04
  • Mohapatra, Debananda. (2023-04). Process Controlled Ruthenium on 2D Engineered V-MXene via Atomic Layer Deposition for Human Healthcare Monitoring. Advanced Science, 10(12). doi: 10.1002/advs.202206355
  • John Wiley and Sons Inc
  • View : 130
  • Download : 31
Article
Rate performance enhancement of lithium-ion battery using precise thickness-controllable-carbon-coated titanium dioxide nanowire array electrode via atomic layer deposition
  • Choi, Taejin ; 
  • Kim, Seong Dae ; 
  • Yeo, Seungmin ; 
  • Cheon, Taehoon ; 
  • Kim, Soo-Hyun ; 
  • Ahn, Jong-Hyun ; 
  • Kim, Hyungjun
  • 2020-02
  • Choi, Taejin. (2020-02). Rate performance enhancement of lithium-ion battery using precise thickness-controllable-carbon-coated titanium dioxide nanowire array electrode via atomic layer deposition. Electrochimica Acta, 334, 135596. doi: 10.1016/j.electacta.2019.135596
  • Pergamon Press Ltd.
  • View : 719
  • Download : 0
Article
Structural control in atomic layer deposited hafnium oxide thin films through vertical cavity surface-emitting laser (VCSEL)-Based ultra-rapid heating
  • Kim, Jae-Hwan ; 
  • Kim, Dohyoung ; 
  • Cho, Jeong-Won ; 
  • Hwang, Heesu ; 
  • Noh, Young-Soo ; 
  • Lee, Myeong-Ill ; 
  • Bae, Seung-Muk ; 
  • Cheon, Taehoon ; 
  • Oh, Youkeun ; 
  • Kim, Dokyun ; 
    • et al
  • 2024-11
  • Kim, Jae-Hwan. (2024-11). Structural control in atomic layer deposited hafnium oxide thin films through vertical cavity surface-emitting laser (VCSEL)-Based ultra-rapid heating. Ceramics International, 50(21), 43819–43827. doi: 10.1016/j.ceramint.2024.08.235
  • Elsevier
  • View : 62
  • Download : 0
Article
The effects of nitrogen incorporation on the properties of atomic layer deposited Ru thin films as a direct-plateable diffusion barrier for Cu interconnect
  • Mun, Ki-Yeung ; 
  • Hong, Tae Eun ; 
  • Cheon, Taehoon ; 
  • Jang, Yujin ; 
  • Lim, Byoung-Yong ; 
  • Kim, Sunjung ; 
  • Kim, Soo-Hyun
  • 2014-07-01
  • Mun, Ki-Yeung. (2014-07-01). The effects of nitrogen incorporation on the properties of atomic layer deposited Ru thin films as a direct-plateable diffusion barrier for Cu interconnect. Thin Solid Films, 562, 118–125. doi: 10.1016/j.tsf.2014.03.088
  • Elsevier
  • View : 710
  • Download : 0
Article
Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
  • Nandi, Dip K. ; 
  • Yeo, Seungmin ; 
  • Ansari, Mohd Zahid ; 
  • Sinha, Soumyadeep ; 
  • Cheon, Taehoon ; 
  • Kwon, Jiseok ; 
  • Kim, Hyungjun ; 
  • Heo, Jaeyeong ; 
  • Song, Taeseup ; 
  • Kim, Soo-Hyun
  • 2019-11
  • Nandi, Dip K. (2019-11). Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery. doi: 10.1016/j.electacta.2019.134766
  • Elsevier Ltd
  • View : 792
  • Download : 0
Article
Ultralow Loading (Single-Atom and Clusters) of the Pt Catalyst by Atomic Layer Deposition Using Dimethyl ((3,4-eta) N,N-dimethyl-3-butene-1-amine-N) Platinum (DDAP) on the High-Surface-Area Substrate for Hydrogen Evolution Reaction
  • Ramesh, Rahul ; 
  • Han, Seungmin ; 
  • Nandi, Dip K. ; 
  • Sawant, Sandesh Y. ; 
  • Kim, Deok Hyun ; 
  • Cheon, Taehoon ; 
  • Cho, Moo Hwan ; 
  • Harada, Ryosuke ; 
  • Shigetomi, Toshiyuki ; 
  • Suzuki, Kazuharu ; 
    • et al
  • 2021-02
  • Ramesh, Rahul. (2021-02). Ultralow Loading (Single-Atom and Clusters) of the Pt Catalyst by Atomic Layer Deposition Using Dimethyl ((3,4-eta) N,N-dimethyl-3-butene-1-amine-N) Platinum (DDAP) on the High-Surface-Area Substrate for Hydrogen Evolution Reaction. Advanced Materials Interfaces, 8(3), 2001508. doi: 10.1002/admi.202001508
  • Wiley-VCH Verlag
  • View : 477
  • Download : 0
Article
Yttrium carbide thin film as an emerging transition metal carbide Prepared by plasma-enhanced atomic layer deposition for Dual diffusion barrier applications into Cu and Ru metallization
  • Kweon, Minjeong ; 
  • Park, Chaehyun ; 
  • Mohapatra, Debananda ; 
  • Kim, Sang Bok ; 
  • Bae, Jong-Seong ; 
  • Cheon, Taehoon ; 
  • Kim, Soo-Hyun
  • 2025-08
  • Kweon, Minjeong. (2025-08). Yttrium carbide thin film as an emerging transition metal carbide Prepared by plasma-enhanced atomic layer deposition for Dual diffusion barrier applications into Cu and Ru metallization. Applied Surface Science, 701. doi: 10.1016/j.apsusc.2025.163302
  • Elsevier
  • View : 60
  • Download : 0
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