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전체 가 나 다 라 마 바 사 아 자 차 카 타 파 하

Showing results 1 to 16 of 16

Article
Al(In)N/GaN Fin-Type HEMT With Very-Low Leakage Current and Enhanced I-V Characteristic for Switching Applications
  • Seo, Jae Hwa ; 
  • Jo, Young-Woo ; 
  • Yoon, Young Jun ; 
  • Son, Dong-Hyeok ; 
  • Won, Chul-Ho ; 
  • Jang, Hwan Soo ; 
  • Kang, In Man ; 
  • Lee, Jung-Hee
  • 2016-07
  • IEEE Electron Device Letters, v.37, no.7, pp.855 - 858
  • Institute of Electrical and Electronics Engineers Inc.
  • View : 922
  • Download : 0
Article
Characterization of optical absorption and photovoltaic properties of silicon wire solar cells with different aspect ratio
  • 2011-01
  • Baek, Seong-Ho. (2011-01). Characterization of optical absorption and photovoltaic properties of silicon wire solar cells with different aspect ratio. doi: 10.1016/j.cap.2010.11.040
  • Elsevier
  • View : 744
  • Download : 0
Article
Combinational Approach of Electrochemical Etching and Metal-Assisted Chemical Etching for p-Type Silicon Wire Formation
  • Jang, Hwan Soo ; 
  • Choi, Ho-Jin ; 
  • Oh, Byeong-Yun ; 
  • Kim, Jae Hyun
  • 2011
  • Jang, Hwan Soo. (2011). Combinational Approach of Electrochemical Etching and Metal-Assisted Chemical Etching for p-Type Silicon Wire Formation. Electrochemical and Solid State Letters, 14(1), D5–D9. doi: 10.1149/1.3504127
  • Electrochemical and Solid-State
  • View : 209
  • Download : 0
Article
Combinational Approach of Electrochemical Etching and Metal-Assisted Chemical Etching for p-Type Silicon Wire Formation
  • Jang, Hwan Soo ; 
  • Choi, Ho-Jin ; 
  • Oh, Byeong-Yun ; 
  • Kim, Jae Hyun
  • 2011-01
  • Electrochemical and Solid State Letters, v.14, no.1, pp.D5 - D9
  • Electrochemical and Solid-State
  • View : 704
  • Download : 0
Article
Eliminating the undercut phenomenon in interference lithography for the fabrication of nano-imprint lithography stamp
  • Jang, Hwan Soo ; 
  • Kim, Gee Hong ; 
  • Lee, Jaejong ; 
  • Choi, Kee Bong
  • 2010-11
  • Jang, Hwan Soo. (2010-11). Eliminating the undercut phenomenon in interference lithography for the fabrication of nano-imprint lithography stamp. Current Applied Physics, 10(6), 1436–1441. doi: 10.1016/j.cap.2010.05.009
  • Elsevier B.V.
  • View : 773
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Article
Eliminating the undercut phenomenon in interference lithography for the fabrication of nano-imprint lithography stamp
  • Jang, Hwan Soo ; 
  • Kim, Gee Hong ; 
  • Lee, Jaejong ; 
  • Choi, Kee Bong
  • 2010-11
  • Jang, Hwan Soo. (2010-11). Eliminating the undercut phenomenon in interference lithography for the fabrication of nano-imprint lithography stamp. Current Applied Physics, 10(6), 1436–1441. doi: 10.1016/j.cap.2010.05.009
  • Elsevier B.V.
  • View : 887
  • Download : 0

Fabrication of AlGaN/GaN Fin-Type HEMT Using a Novel T-Gate Process for Improved Radio-Frequency Performance

Article
Fabrication of AlGaN/GaN Fin-Type HEMT Using a Novel T-Gate Process for Improved Radio-Frequency Performance
  • Cho, Min Su ; 
  • Seo, Jae Hwa ; 
  • Lee, Sang Ho ; 
  • Jang, Hwan Soo ; 
  • Kang, In Man
  • 2020-07
  • Cho, Min Su. (2020-07). Fabrication of AlGaN/GaN Fin-Type HEMT Using a Novel T-Gate Process for Improved Radio-Frequency Performance. doi: 10.1109/ACCESS.2020.3011103
  • Institute of Electrical and Electronics Engineers Inc.
  • View : 491
  • Download : 482
Article
Fabrication of Ordered Silicon Wire Structures via Macropores without Pore Wall by Electrochemical Etching
  • 2012
  • Jang, Hwan Soo. (2012). Fabrication of Ordered Silicon Wire Structures via Macropores without Pore Wall by Electrochemical Etching. Journal of the Electrochemical Society, 159(2), D37–D45. doi: 10.1149/2.001202jes
  • Electrochemical Society
  • View : 265
  • Download : 0
Article
Fabrication of Ordered Silicon Wire Structures via Macropores without Pore Wall by Electrochemical Etching
  • 2012
  • Jang, Hwan Soo. (2012). Fabrication of Ordered Silicon Wire Structures via Macropores without Pore Wall by Electrochemical Etching. Journal of the Electrochemical Society, 159(2), D37–D45. doi: 10.1149/2.001202jes
  • Electrochemical Society
  • View : 985
  • Download : 0
Article
Fabrication of p-Type Silicon Nanowire Arrays with a High Aspect Ratio Using Electrochemical and Alkaline Etching
  • 2012-04
  • Jang, Hwan Soo. (2012-04). Fabrication of p-Type Silicon Nanowire Arrays with a High Aspect Ratio Using Electrochemical and Alkaline Etching. doi: 10.1166/jnn.2012.5591
  • American Scientific Publishers
  • View : 545
  • Download : 0
Article
Formation of p-Silicon Wire by Electrochemical Etching Using Positive Photoresist as an Etch Mask in Organic Electrolyte
  • Jang, Hwan Soo ; 
  • Choi, Ho-Jin ; 
  • Kang, Sung Min
  • 2011
  • Jang, Hwan Soo. (2011). Formation of p-Silicon Wire by Electrochemical Etching Using Positive Photoresist as an Etch Mask in Organic Electrolyte. Electrochemical and Solid State Letters, 14(8), D84–D88. doi: 10.1149/1.3594111
  • Electrochemical Society
  • View : 240
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Article
Formation of p-Silicon Wire by Electrochemical Etching Using Positive Photoresist as an Etch Mask in Organic Electrolyte
  • Jang, Hwan Soo ; 
  • Choi, Ho-Jin ; 
  • Kang, Sung Min
  • 2011-01
  • Electrochemical and Solid State Letters, v.14, no.8, pp.D84 - D88
  • Electrochemical Society
  • View : 713
  • Download : 0
Article
Low voltage operation of GaN vertical nanowire MOSFET
  • Son, Dong Hyeok ; 
  • Jo, Young Woo ; 
  • Seo, Jae Hwa ; 
  • Won, Chul Ho ; 
  • Im, Ki Sik ; 
  • Lee, Yong Soo ; 
  • Jang, Hwan Soo ; 
  • Kim, Dae Hyun ; 
  • Kang, In Man ; 
  • Lee, Jung Hee
  • 2018-07
  • Son, Dong Hyeok. (2018-07). Low voltage operation of GaN vertical nanowire MOSFET. Solid-State Electronics, 145, 1–7. doi: 10.1016/j.sse.2018.03.001
  • Elsevier Ltd
  • View : 287
  • Download : 0
Article
Optimization of metal-assisted chemical etching process in fabrication of p-type silicon wire arrays
  • 2011-01
  • Choi, Ho-Jin. (2011-01). Optimization of metal-assisted chemical etching process in fabrication of p-type silicon wire arrays. doi: 10.1016/j.cap.2010.11.047
  • Elsevier B.V.
  • View : 672
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Article
Optimization of wire array formation in p-type silicon for solar cell application
  • 2011-01
  • Jang, Hwan Soo. (2011-01). Optimization of wire array formation in p-type silicon for solar cell application. doi: 10.1016/j.cap.2010.11.037
  • Elsevier B.V.
  • View : 586
  • Download : 0
Article
Transparent conductive ZnO:Al films grown by atomic layer deposition for Si-wire-based solar cells
  • Oh, Byeong-Yun ; 
  • Kim, Jeong-Hwan ; 
  • Han, Jin-Woo ; 
  • Seo, Dae-Shik ; 
  • Jang, Hwan Soo ; 
  • Choi, Ho-Jin ; 
  • Baek, Seong-Ho ; 
  • Kim, Jae Hyun ; 
  • Heo, Gi-Seok ; 
  • Kim, Tae-Won ; 
    • et al
  • 2012-01
  • Oh, Byeong-Yun. (2012-01). Transparent conductive ZnO:Al films grown by atomic layer deposition for Si-wire-based solar cells. doi: 10.1016/j.cap.2011.06.017
  • Elsevier B.V.
  • View : 714
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