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- Eom, Tae-Kwang ;
- Sari, Windu ;
- Cheon, Taehoon ;
- Kim, Soo-Hyun ;
- Kim, Woo Kyoung
- 2012-10
- Eom, Tae-Kwang. (2012-10). A bilayer diffusion barrier of Ru/WSixNy for advanced Cu interconnects. doi: 10.1016/j.tsf.2012.03.068
- Elsevier BV
- View : 901
- Download : 0
Article
Advanced Atomic Layer Modulation Based Highly Homogeneous PtRu Precious Metals Alloy Thin Films
- Son, Yeseul ;
- Kim, Sang Bok ;
- Mohapatra, Debananda ;
- ;
- Kim, Soo-Hyun
- 2025-08
- Advanced Science, v.12, no.29
- Wiley
- View : 111
- Download : 0
- Park, Chaehyun ;
- Kweon, Minjeong ;
- Mohapatra, Debananda ;
- ;
- Bae, Jong-Seong ;
- Jeong, Daeyoon ;
- Park, Young-Bae ;
- Kim, Soo-Hyun
- 2025-06-03
- International Interconnect Technology Conference, IITC 2025, pp.1 - 3
- Korean Institute of Electrical and Electronic Material Engineers(한국전기전자재료학회)
- View : 19
- Download : 0
- Hong, Tae Eun ;
- Choi, Sang-Hyeok ;
- Yeo, Seungmin ;
- Park, Ji-Yoon ;
- Kim, Soo-Hyun ;
- ;
- Kim, Hoon ;
- Kim, Min-Kyu ;
- Kim, Hyungjun
- 2013-01
- Hong, Tae Eun. (2013-01). Atomic Layer Deposition of Ru Thin Films Using a Ru(0) Metallorganic Precursor and O-2. ECS Journal of Solid State Science and Technology, 2(3), P47–P53. doi: 10.1149/2.001303jss
- Electrochemical Society, Inc.
- View : 606
- Download : 0
- Kim, Youn-Hye ;
- Kotsugi, Yohei ;
- ;
- Ramesh, Rahul ;
- Kim, Soo-Hyun
- 2021-07-06
- Kim, Youn-Hye. (2021-07-06). Atomic layer deposition of RuO2 using a new metalorganic precursor as a diffusion barrier for Ru interconnect. 24th Annual IEEE International Interconnect Technology Conference, IITC 2021. doi: 10.1109/IITC51362.2021.9537498
- Institute of Electrical and Electronics Engineers Inc.
- View : 147
- Download : 0
- Yeo, Seungmin ;
- Choi, Sang-Hyeok ;
- Park, Ji-Yoon ;
- Kim, Soo-Hyun ;
- Cheon, Taehoon ;
- Lim, Byoung-Yong ;
- Kim, Sunjung
- 2013-11
- Yeo, Seungmin. (2013-11). Atomic layer deposition of ruthenium (Ru) thin films using ethylbenzen-cyclohexadiene Ru(0) as a seed layer for copper metallization. doi: 10.1016/j.tsf.2013.03.074
- Elsevier BV
- View : 769
- Download : 0
- Nguyen, Chi Thang ;
- Gu, Bonwook ;
- ;
- Park, Jeongwoo ;
- Khan, Mohammad Rizwan ;
- Kim, Soo-Hyun ;
- Shong, Bonggeun ;
- Lee, Han-Bo-Ram
- 2021-06
- Nguyen, Chi Thang. (2021-06). Atomic Layer Modulation of Multicomponent Thin Films through Combination of Experimental and Theoretical Approaches. Chemistry of Materials, 33(12), 4435–4444. doi: 10.1021/acs.chemmater.1c00508
- American Chemical Society
- View : 379
- Download : 0
- Ramesh, Rahul ;
- Nandi, Dip K. ;
- Kim, Tae Hyun ;
- Cheon, Taehoon ;
- Oh, Jihun ;
- Kim, Soo-Hyun
- 2019-05
- Ramesh, Rahul. (2019-05). Atomic-Layer-Deposited MoN x Thin Films on Three-Dimensional Ni Foam as Efficient Catalysts for the Electrochemical Hydrogen Evolution Reaction. doi: 10.1021/acsami.8b20437
- American Chemical Society
- View : 887
- Download : 0
- Lee, Soobin ;
- Koo, Jaseok ;
- Kim, Sammi ;
- Kim, Soo-Hyun ;
- Cheon, Taehoon ;
- Oh, Jong Seok ;
- Kim, Suk Jin ;
- Kim, Woo Kyoung
- 2013-05
- Lee, Soobin. (2013-05). Characteristics ofMoSe(2) formation during rapid thermal processing ofMo-coated glass. doi: 10.1016/j.tsf.2012.10.035
- Elsevier
- View : 669
- Download : 0
- Nam, Taewook ;
- Lee, Chang Wan ;
- ;
- Lee, Woo Jae ;
- Kim, Soo-Hyun ;
- Kwon, Se-Hun ;
- Lee, Han-Bo-Ram ;
- Kim, Hyungjun
- 2018-03
- Nam, Taewook. (2018-03). Cobalt titanium nitride amorphous metal alloys by atomic layer deposition. Journal of Alloys and Compounds, 737, 684–692. doi: 10.1016/j.jallcom.2017.12.023
- Elsevier BV
- View : 555
- Download : 0
- Koo, Jaseok ;
- ;
- ;
- Kim, Soo-Hyun ;
- Kim, Woo Kyoung
- 2018-03
- Koo, Jaseok. (2018-03). Detailed Visualization of Phase Evolution during Rapid Formation of Cu(InGa)Se-2 Photovoltaic Absorber from Mo/CuGa/In/Se Precursors. Scientific Reports, 8. doi: 10.1038/s41598-018-22214-y
- NATURE PUBLISHING GROUP
- View : 563
- Download : 136
- Nakazawa, Tatsuya ;
- Kim, Donghyun ;
- Kim, Jaehyeok ;
- Kotsugi, Yohei ;
- ;
- Chung, Seung-Min ;
- Kim, Soo-Hyun ;
- Kim, Hyungjun
- 2022-09
- Nakazawa, Tatsuya. (2022-09). Development of RuS2 for near-infrared photodetector by atomic layer deposition and post-sulfurization. Rare Metals, 41(9), 3086–3099. doi: 10.1007/s12598-022-02012-2
- University of Science and Technology Beijing
- View : 366
- Download : 0
- Ansari, Mohd Zahid ;
- Parveen, Nazish ;
- Nandi, Dip K. ;
- Ramesh, Rahul ;
- Ansari, Sajid Ali ;
- Cheon, Taehoon ;
- Kim, Soo-Hyun
- 2019-07
- Ansari, Mohd Zahid. (2019-07). Enhanced activity of highly conformal and layered tin sulfide (SnSx) prepared by atomic layer deposition (ALD) on 3D metal scaffold towards high performance supercapacitor electrode. doi: 10.1038/s41598-019-46679-7
- Nature Publishing Group
- View : 1052
- Download : 279
Article
Functionalization of Si3N4 with an aldehyde inhibitor for area selective deposition of HfO2 and SiO2
- Lee, Byungchan ;
- Shim, Seungwon ;
- Trinh, Ngoc Le ;
- Patil, Aravind H. ;
- Nguyen, Chi Thang ;
- ;
- Kim, Soo-Hyun ;
- Kang, Youngho ;
- Lee, Han-Bo-Ram
- 2025-09
- Journal of Materials Chemistry C, v.13, no.37, pp.19316 - 19329
- Royal Society of Chemistry
- View : 43
- Download : 0
- Park, Ji-Yoon ;
- Yeo, Seungmin ;
- ;
- Kim, Soo-Hyun ;
- Kim, Min-Kyu ;
- Kim, Hyungjun ;
- Hong, Tae Eun ;
- Lee, Do-Joong
- 2014-10-15
- Park, Ji-Yoon. (2014-10-15). Growth of highly conformal ruthenium-oxide thin films with enhanced nucleation by atomic layer deposition. Journal of Alloys and Compounds, 610, 529–539. doi: 10.1016/j.jallcom.2014.04.186
- Elsevier
- View : 810
- Download : 0
- Hong, Tae Eun ;
- Choi, Sang-Kyung ;
- Kim, Soo-Hyun ;
- 2013-04
- Hong, Tae Eun. (2013-04). Growth of Highly Conformal TiCx Films Using Atomic Layer Deposition Technique. Journal of the American Ceramic Society, 96(4), 1060–1062. doi: 10.1111/jace.12289
- Wiley Blackwell
- View : 623
- Download : 0
- Park, Chaehyun ;
- Kweon, Minjeong ;
- Mohapatra, Debananda ;
- ;
- Bae, Jong-Seong ;
- Jeong, Daeyoon ;
- Jang, Hyunwoo ;
- Shim, Seungwon ;
- Park, Young-Bae ;
- Kang, Youngho ; et al
- 2025-06
- Park, Chaehyun. (2025-06). Highly Conductive Ultrathin Niobium Carbide Thin Films as Next-Generation Diffusion Barriers for Cu and Ru Interconnects Prepared by Plasma-Enhanced Atomic Layer Deposition. Chemistry of Materials, 37(13), 4743–4757. doi: 10.1021/acs.chemmater.5c00557
- American Chemical Society
- View : 1091
- Download : 0
- Kim, Jeongha ;
- Mohapatra, Debananda ;
- Son, Yeseul ;
- Jang, Jae Min ;
- Kim, Sang Bok ;
- ;
- Shong, Boggeun ;
- Kim, Soo-Hyun
- 2025-06-04
- International Interconnect Technology Conference, IITC 2025, pp.1 - 3
- Korean Institute of Electrical and Electronic Material Engineers(한국전기전자재료학회)
- View : 17
- Download : 0
- Mohapatra, Debananda ;
- Byun, Jeong Eun ;
- Ansari, Mohd Zahid ;
- Kim, Haekyoung ;
- ;
- Jang, Jongmoon ;
- Cho, Young-Rae ;
- Lee, Jung Woo ;
- Kim, Soo-Hyun
- 2023-12
- Mohapatra, Debananda. (2023-12). Layer Engineered MXene Empowered Wearable Pressure Sensors for Non-Invasive Vital Human–Machine Interfacing Healthcare Monitoring. Advanced Materials Technologies, 8(24). doi: 10.1002/admt.202301175
- Wiley
- View : 94
- Download : 0
- Eom, Tae-Kwang ;
- Sari, Windu ;
- Choi, Kyu-Jeong ;
- Shin, Woong-Chul ;
- Kim, Jae Hyun ;
- Lee, Do-Joong ;
- Kim, Ki-Bum ;
- Sohn, Hyunchul ;
- Kim, Soo-Hyun
- 2009
- Eom, Tae-Kwang. (2009). Low Temperature Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and O-2. Electrochemical and Solid State Letters, 12(11), D85–D88. doi: 10.1149/1.3207867
- Electrochemical Society
- View : 330
- Download : 0
- Eom, Tae-Kwang ;
- Sari, Windu ;
- Choi, Kyu-Jeong ;
- Shin, Woong-Chul ;
- Kim, Jae Hyun ;
- Lee, Do-Joong ;
- Kim, Ki-Bum ;
- Sohn, Hyunchul ;
- Kim, Soo-Hyun
- 2009
- Eom, Tae-Kwang. (2009). Low Temperature Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and O-2. Electrochemical and Solid State Letters, 12(11), D85–D88. doi: 10.1149/1.3207867
- Electrochemical Society
- View : 896
- Download : 0
- Ansari, Mohd Zahid ;
- Nandi, Dip K. ;
- Janicek, Petr ;
- Ansari, Sajid Ali ;
- Ramesh, Rahul ;
- ;
- Shong, Bonggeun ;
- Kim, Soo-Hyun
- 2019-11
- Ansari, Mohd Zahid. (2019-11). Low-Temperature Atomic Layer Deposition of Highly Conformal Tin Nitride Thin Films for Energy Storage Devices. ACS Applied Materials & Interfaces, 11(46), 43608–43621. doi: 10.1021/acsami.9b15790
- American Chemical Society
- View : 863
- Download : 0
- Kweon, Minjeong ;
- Park, Chaehyun ;
- Mohapatra, Debananda ;
- Kim, Sang Bok ;
- Bae, Jong-Seong ;
- ;
- Kim, Soo-Hyun
- 2025-06-04
- International Interconnect Technology Conference, IITC 2025, pp.1 - 3
- Korean Institute of Electrical and Electronic Material Engineers(한국전기전자재료학회)
- View : 16
- Download : 0
- Ansari, Mohd Zahid ;
- Janicek, Petr ;
- Park, Ye Jin ;
- NamGung, Sook ;
- Cho, Bo Yeon ;
- Nandi, Dip K. ;
- Jang, Yujin ;
- Bae, Jong-Seong ;
- Hong, Tae Eun ;
- ; et al
- 2023-05
- Ansari, Mohd Zahid. (2023-05). Preparation of wafer-scale highly conformalamorphous hafnium dioxide thin films by atomic layer deposition using a thermally stable boratabenzene ligand-containing hafnium precursor. Applied Surface Science, 620. doi: 10.1016/j.apsusc.2023.156834
- Elsevier BV
- View : 211
- Download : 0
- Mohapatra, Debananda ;
- Shin, Yujin ;
- Ansari, Mohd Zahid ;
- Kim, Youn-Hye ;
- Park, Ye Jin ;
- ;
- Kim, Haekyoung ;
- Lee, Jung Woo ;
- Kim, Soo-Hyun
- 2023-04
- Mohapatra, Debananda. (2023-04). Process Controlled Ruthenium on 2D Engineered V-MXene via Atomic Layer Deposition for Human Healthcare Monitoring. Advanced Science, 10(12). doi: 10.1002/advs.202206355
- John Wiley and Sons Inc
- View : 151
- Download : 43
- Choi, Taejin ;
- Kim, Seong Dae ;
- Yeo, Seungmin ;
- ;
- Kim, Soo-Hyun ;
- Ahn, Jong-Hyun ;
- Kim, Hyungjun
- 2020-02
- Choi, Taejin. (2020-02). Rate performance enhancement of lithium-ion battery using precise thickness-controllable-carbon-coated titanium dioxide nanowire array electrode via atomic layer deposition. Electrochimica Acta, 334, 135596. doi: 10.1016/j.electacta.2019.135596
- Pergamon Press Ltd.
- View : 744
- Download : 0
- Mun, Ki-Yeung ;
- Hong, Tae Eun ;
- ;
- Jang, Yujin ;
- Lim, Byoung-Yong ;
- Kim, Sunjung ;
- Kim, Soo-Hyun
- 2014-07-01
- Mun, Ki-Yeung. (2014-07-01). The effects of nitrogen incorporation on the properties of atomic layer deposited Ru thin films as a direct-plateable diffusion barrier for Cu interconnect. Thin Solid Films, 562, 118–125. doi: 10.1016/j.tsf.2014.03.088
- Elsevier
- View : 743
- Download : 0
- Nandi, Dip K. ;
- Yeo, Seungmin ;
- Ansari, Mohd Zahid ;
- Sinha, Soumyadeep ;
- Cheon, Taehoon ;
- Kwon, Jiseok ;
- Kim, Hyungjun ;
- Heo, Jaeyeong ;
- Song, Taeseup ;
- Kim, Soo-Hyun
- 2019-11
- Nandi, Dip K. (2019-11). Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery. doi: 10.1016/j.electacta.2019.134766
- Elsevier Ltd
- View : 827
- Download : 0
- Ramesh, Rahul ;
- Han, Seungmin ;
- Nandi, Dip K. ;
- Sawant, Sandesh Y. ;
- Kim, Deok Hyun ;
- ;
- Cho, Moo Hwan ;
- Harada, Ryosuke ;
- Shigetomi, Toshiyuki ;
- Suzuki, Kazuharu ; et al
- 2021-02
- Ramesh, Rahul. (2021-02). Ultralow Loading (Single-Atom and Clusters) of the Pt Catalyst by Atomic Layer Deposition Using Dimethyl ((3,4-eta) N,N-dimethyl-3-butene-1-amine-N) Platinum (DDAP) on the High-Surface-Area Substrate for Hydrogen Evolution Reaction. Advanced Materials Interfaces, 8(3), 2001508. doi: 10.1002/admi.202001508
- Wiley-VCH Verlag
- View : 502
- Download : 0
- Kweon, Minjeong ;
- Park, Chaehyun ;
- Mohapatra, Debananda ;
- Kim, Sang Bok ;
- Bae, Jong-Seong ;
- ;
- Kim, Soo-Hyun
- 2025-08
- Kweon, Minjeong. (2025-08). Yttrium carbide thin film as an emerging transition metal carbide Prepared by plasma-enhanced atomic layer deposition for Dual diffusion barrier applications into Cu and Ru metallization. Applied Surface Science, 701. doi: 10.1016/j.apsusc.2025.163302
- Elsevier
- View : 84
- Download : 0
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