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Showing results 1 to 10 of 10

Article
Conformal Coating of Conductive ZnO:Al Films as Transparent Electrodes on High Aspect Ratio Si Microrods
  • 2010
  • Kong, Bo Hyun. (2010). Conformal Coating of Conductive ZnO:Al Films as Transparent Electrodes on High Aspect Ratio Si Microrods. Electrochemical and Solid State Letters, 13(2), K12–K14. doi: 10.1149/1.3267051
  • Electrochemical and Solid-State
  • View : 1273
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Article
Conformal Coating of Conductive ZnO:Al Films as Transparent Electrodes on High Aspect Ratio Si Microrods
  • 2010
  • Kong, Bo Hyun. (2010). Conformal Coating of Conductive ZnO:Al Films as Transparent Electrodes on High Aspect Ratio Si Microrods. Electrochemical and Solid State Letters, 13(2), K12–K14. doi: 10.1149/1.3267051
  • Electrochemical and Solid-State
  • View : 647
  • Download : 0
Article
Fabrication of Ordered Silicon Wire Structures via Macropores without Pore Wall by Electrochemical Etching
  • 2012
  • Jang, Hwan Soo. (2012). Fabrication of Ordered Silicon Wire Structures via Macropores without Pore Wall by Electrochemical Etching. Journal of the Electrochemical Society, 159(2), D37–D45. doi: 10.1149/2.001202jes
  • Electrochemical Society
  • View : 275
  • Download : 0
Article
Fabrication of Ordered Silicon Wire Structures via Macropores without Pore Wall by Electrochemical Etching
  • 2012
  • Jang, Hwan Soo. (2012). Fabrication of Ordered Silicon Wire Structures via Macropores without Pore Wall by Electrochemical Etching. Journal of the Electrochemical Society, 159(2), D37–D45. doi: 10.1149/2.001202jes
  • Electrochemical Society
  • View : 998
  • Download : 0
Article
Formation of Macropore and Three-Dimensional Nanorod Array in p-Type Silicon
  • 2010-05
  • Kim, Kang-Pil. (2010-05). Formation of Macropore and Three-Dimensional Nanorod Array in p-Type Silicon. Japanese Journal of Applied Physics, 49(5). doi: 10.1143/JJAP.49.056503
  • Institute of Physics Publishing
  • View : 266
  • Download : 0
Article
Formation of Macropore and Three-Dimensional Nanorod Array in p-Type Silicon
  • 2010-05
  • Kim, Kang-Pil. (2010-05). Formation of Macropore and Three-Dimensional Nanorod Array in p-Type Silicon. Japanese Journal of Applied Physics, 49(5). doi: 10.1143/JJAP.49.056503
  • Institute of Physics Publishing
  • View : 802
  • Download : 0
Article
Formation of p-Silicon Wire by Electrochemical Etching Using Positive Photoresist as an Etch Mask in Organic Electrolyte
  • Jang, Hwan Soo ; 
  • Choi, Ho-Jin ; 
  • Kang, Sung Min
  • 2011
  • Jang, Hwan Soo. (2011). Formation of p-Silicon Wire by Electrochemical Etching Using Positive Photoresist as an Etch Mask in Organic Electrolyte. Electrochemical and Solid State Letters, 14(8), D84–D88. doi: 10.1149/1.3594111
  • Electrochemical Society
  • View : 249
  • Download : 0
Article
Formation of p-Silicon Wire by Electrochemical Etching Using Positive Photoresist as an Etch Mask in Organic Electrolyte
  • Jang, Hwan Soo ; 
  • Choi, Ho-Jin ; 
  • Kang, Sung Min
  • 2011-01
  • Electrochemical and Solid State Letters, v.14, no.8, pp.D84 - D88
  • Electrochemical Society
  • View : 724
  • Download : 0
Article
Low Temperature Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and O-2
  • Eom, Tae-Kwang ; 
  • Sari, Windu ; 
  • Choi, Kyu-Jeong ; 
  • Shin, Woong-Chul ; 
  • Kim, Jae Hyun ; 
  • Lee, Do-Joong ; 
  • Kim, Ki-Bum ; 
  • Sohn, Hyunchul ; 
  • Kim, Soo-Hyun
  • 2009
  • Eom, Tae-Kwang. (2009). Low Temperature Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and O-2. Electrochemical and Solid State Letters, 12(11), D85–D88. doi: 10.1149/1.3207867
  • Electrochemical Society
  • View : 319
  • Download : 0
Article
Low Temperature Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and O-2
  • Eom, Tae-Kwang ; 
  • Sari, Windu ; 
  • Choi, Kyu-Jeong ; 
  • Shin, Woong-Chul ; 
  • Kim, Jae Hyun ; 
  • Lee, Do-Joong ; 
  • Kim, Ki-Bum ; 
  • Sohn, Hyunchul ; 
  • Kim, Soo-Hyun
  • 2009
  • Eom, Tae-Kwang. (2009). Low Temperature Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and O-2. Electrochemical and Solid State Letters, 12(11), D85–D88. doi: 10.1149/1.3207867
  • Electrochemical Society
  • View : 884
  • Download : 0
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